Predicted effect of shot noise on contact hole dimension in e-beam lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 24, Issue 6, 2006, Pages 2931-2935

  Kruit, P ^a   Steenbrink, S ^b   Wieland, M ^b  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b MAPPER Lithography BV   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; PHOTOLITHOGRAPHY; PHOTONS; PHOTORESISTS; SHOT NOISE;

CONTACT HOLES; CRITICAL DIMENSION (CD); EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY;

ELECTRON BEAM LITHOGRAPHY;

EID: 33845237634     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2387153     Document Type: Article

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