Optimum dose for shot noise limited CD uniformity in electron-beam lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 6, 2004, Pages 2948-2955

  Kruit, P ^a   Steenbrink, S ^b   Jager, R ^b   Wieland, M ^b  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b MAPPER Lithography BV   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DIFFUSION; ELECTRON BEAMS; ELECTRON OPTICS; ION BEAMS; MATHEMATICAL MODELS; MONTE CARLO METHODS; OPTIMIZATION; PHOTONS; POISSON DISTRIBUTION; RANDOM PROCESSES; SHOT NOISE; THROUGHPUT; X RAYS;

CRITICAL DIMENSIONS (CD); GAUSSIAN BEAMS; LINEWIDTH ROUGHNESS (LWR); POINT SPREAD FUNCTIONS (PSF);

ELECTRON BEAM LITHOGRAPHY;

EID: 13244292696     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1821577     Document Type: Conference Paper

References (13)

1. H. I. Smith, J. Vac. Sci. Technol. B 4, 148 (1986).
2. H. I. Smith, J. Vac. Sci. Technol. B 6, 346 (1988).
3. H. I. Smith, "Lecture 22," private communication (2004).
4. A. Neureuther and C. G. Wilson, J. Vac. Sci. Teehnol. B 6, 167 (1988).
5. S. Turner, C. Babcock, and F. Cerrina, J. Vac. Sci. Technol. B 9, 3440 (1991).
6. W. Henke and M. Torkler, J. Vac. Sci. Technol. B 17, 3112 (1999).
7. L. E. Ocola, P. A. Orphanos, W. Y. Li, W. Waskiewicz, A. E. Novembre, and M. Sato, J. Vac. Sci. Technol. B 18, 3435 (2000).
8. T. Nakasugi, A. Ando, R. Inanami, N. Sasaki, K. Sugihara, M. Miyoshi, and H. Fujioka, Jpn. J. Appl. Phys., Part 1 41, 4157 (2002).
9. M. Kotera, T. Yamada, and Y. Ishida, Jpn. J. Appl. Phys., Part 1 41, 4150 (2002).
10. G. M. Gallatin and F. A. Houle, J. Vac. Sci. Technol. B 21, 3172 (2003).
11. N. Rau, F. Stratton, C. Fields, T. Ogawa, A. Neureuther, R. Kubena, and G. Wilson, J. Vac. Sci. Technol. B 16, 3784 (1998).
12. S. Eder-Kapl, H. Loeschner, M. Zeininger, W. Fallman, O. Kirch, G. P. Patsis, V. Constantoudis, and E. Gogolides, Microelectron. Eng. 73-74, 252 (2004).
13. L. H. A. Leunissen, W. G. Lawrence, and M. Ercken, Microelectron. Eng. 73-74, 265 (2004).