Mask distortion issues for next-generation lithography

Microelectronic Engineering

Volumn 69, Issue 2-4, 2003, Pages 420-428

  Reu, P L ^a   Engelstad, R L ^a   Lovell, E G ^a  

^a University of Wisconsin Madison   (United States)

Author keywords

Electron projection lithography; EPL masks; Finite element analysis; Pattern transfer distortions

Indexed keywords

COMPUTER SIMULATION; ELECTRON BEAM LITHOGRAPHY; FINITE ELEMENT METHOD; MASKS; STATIC RANDOM ACCESS STORAGE;

MASK DISTORTION;

MICROELECTRONIC PROCESSING;

EID: 0141679682     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(03)00330-7     Document Type: Conference Paper

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