Evaluation of intrinsic film stress distributions from induced substrate deformation

Microelectronic Engineering

Volumn 78-79, Issue 1-4, 2005, Pages 404-409

  Engelstad, R L ^a   Feng, Z ^a   Lovell, E G ^a   Mikkelson, A R ^a   Sohn, J ^a  

^a University of Wisconsin Madison   (United States)

Author keywords

Finite element methods; Lithography; Nanofabrication; Stress measurement; Thin films

Indexed keywords

DEFORMATION; FINITE ELEMENT METHOD; LITHOGRAPHY; MASKS; NANOTECHNOLOGY; OPTIMIZATION; ROTATION; STRESS CONCENTRATION; SUBSTRATES; SURFACE CHEMISTRY;

FILM STRESS; NANO-ENGINEERING; STONEY'S EQUATIONS; STRESS MEASUREMENT;

THIN FILMS;

EID: 14944359214     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2005.01.011     Document Type: Conference Paper

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