Elimination of stress-induced curvature in thin-film structures

Journal of Microelectromechanical Systems

Volumn 11, Issue 5, 2002, Pages 592-597

  Bifano, Thomas G ^a   Johnson, Harley T ^b   Bierden, Paul ^c   Mali, Raji Krishnamoorthy ^d  

^a BOSTON UNIVERSITY   (United States)

^b University of Illinois at Urbana Champaign   (United States)

^c BOSTON MICROMACHINES CORPORATION   (United States)

^d Standard MEMS Corporation   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ION BEAMS; MATHEMATICAL MODELS; MICROELECTROMECHANICAL DEVICES; MICROMACHINING; MIRRORS; SEMICONDUCTING SILICON; STRESS CONCENTRATION; SUBSTRATES;

ION BEAM MACHINING METHOD; THIN FILM MIRRORS;

THIN FILM DEVICES;

EID: 0036772610     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/JMEMS.2002.802908     Document Type: Article

References (8)

1. R. P. Vinci and J. J. Vlassak, "Mechanical behavior of thin flims," in Annu. Rev. Mater. Sci. 26: Annual Reviews Inc., 1996, pp. 431-462.
2. G. G. Stoney, "The tension of metallic flims deposited by electrolysis," Proc. Royal Soc. London, vol. A82, p. 172, 1909.
3. W. Fang and J. A. Wickert, "Determining mean and gradient residual stresses in thin films using micromachined cantilevers," J. Micromechan. Microeng., vol. 6, no. 3, pp. 301-309, 1996.
4. F. Yuan, Y. Shih, L. V. Knight, R. T. Perkins, and D. D. Allred, "Using thinfilms to produce precision, figured X-ray optics," Thin Solid Films, vol. 220, no. 1-2, pp. 284-288, 1992.
5. R. Nowack, Y. Miyagawa, C. L. Li, S. Nakao, S. Maruno, and S. Miyagawa, "Post-deposition reduction of internal stress in thin films: The case of HfN coatings bombarded with Au ions," Mater. Lett., vol. 33, no. 1-2, pp. 31-36, 1997.
6. G. C. Johnson and P. Krulevitch, Stress Gradients in Thin Films Used in Micro-Electro-Mechanical Systems: American Society of Mechanical Engineers, Dynamic Systems and Control Division, 1993, vol. 46, DSC, pp. 89-95.
7. L. B. Freund, "Some elementary connections between curvature and mismatch strain in compositionally graded thin films," J. Mechan. Phys. Solids, vol. 44, p. 723, 1996.
8. T. G. Bifano, J. Perreault, R. K. Mali, and M. N. Horenstein, "Microelectromechanical deformable mirrors," J. Select. Topics Quantum Electron., vol. 5, pp. 83-90, 1999.