Comparison of CH 4 /H 2 and C 2 H 6 /H 2 inductively coupled plasma etching of ZnO

Applied Surface Science

Volumn 253, Issue 3, 2006, Pages 1269-1273

  Lim, Wantae ^a   Voss, Lars ^a   Khanna, Rohit ^a   Gila, B P ^a   Norton, D P ^a   Pearton, S J ^a   Ren, F ^b  

^a UNIVERSITY OF FLORIDA   (United States)

^b University of Florida   (United States)

Author keywords

Etching; Surface modification; ZnO

Indexed keywords

DRY ETCHING; ELECTRIC DISCHARGES; INDUCTIVELY COUPLED PLASMA; INERT GASES; SINGLE CRYSTALS; SUBSTITUTION REACTIONS; SURFACE TREATMENT;

BAND EDGE PHOTOLUMINESCENCE INTENSITY; INDUCTIVELY COUPLED PLASMA ETCHING; NEAR SURFACE REGION; SURFACE CONTAMINATION;

ZINC OXIDE;

EID: 33750743389     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2006.01.081     Document Type: Article

References (35)

1. Look D.C. Mater. Sci. Eng. B 80 (2001) 383
2. Nause J.E. III-V's Review 12 (1999) 28
3. Zu P., Tang Z.K., Wong G.K.L., Kawasaki M., Ohtomo A., Koinuma K., and Sagawa Y. Solid-State Commun. 103 (1997) 459
4. Li Y., Tompa G.S., Liang S., Gorla C., Lu C., and Doyle J. J. Vac. Sci. Technol. A 15 (1997) 1663
5. Bagnall D.M., Chen Y.R., Zhu Z., Yao T., Koyama S., Shen M.Y., and Goto T. Appl. Phys. Lett. 70 (1997) 2230
6. Aoki T., Hatanaka Y., and Look D.C. Appl. Phys. Lett. 76 (2000) 3257
7. Wager J.F. Science 300 (2003) 1245
8. Ohta H., and Hosono H. Mater. Today 7 (2004) 42
9. Kawazoe H., Yasukawa M., Hyodo H., Kurita M., Yanagi H., and Hosono H. Nature 389 (1997) 939
10. Kudo A., Yanagi H., Hosono H., and Kawazoe H. Appl. Phys. Lett. 73 (1998) 220
11. Ohta H., Kawamura K., Orita M., Hirano M., Sarukura N., and Hosono H. Appl. Phys. Lett. 77 (2000) 475
12. Kawazeo H., Yanagi H., Ueda K., and Hosono H. MRS Bull. 25 (2000) 28
13. Yanagi H., Ueda K., Ohta H., Orita M., Hirano M., and Hosono H. Solid-State Commun. 121 (2002) 15
14. Look D.C., Claflin B., Alivov Y.I., and Park S.J. Phys. Stat. Sol. (a) 201 (2004) 2203
15. Kawasaki M., Tamura K., Saikusa K., Aita T., Tsukazaki A., Ohtomo A., Jin Z.G., Matsumoto Y., Fukumura T., Koinuma H., Ohmaki Y., Kishimoto S., Ohno Y., Matsukura F., Ohno H., Makino T., Tuan N.T., Sun H.D., Chia C.H., Segawa Y., Tang Z.K., and Wang G.K.L. Ext. Abstr. of the 2000 International Conference on Solid-State Dev. Mater. (2000) 128
16. Ohtomo A., and Kawasaki M. IEICE Trans. Electron. E83-C (2000) 1614
17. Masuda S., Kitamura K., Okumura Y., Miyatake S., Tabata H., and Kawai T. J. Appl. Phys. 93 (2003) 1624
18. Hoffman R.L., Norris B.J., and Wager J.F. Appl. Phys. Lett. 82 (2003) 733
19. Carcia P.F., McLean R.S., Reilly M.H., and Nunes Jr. G. Appl. Phys. Lett. 82 (2003) 1117
20. Hoffman R.L. J. Appl. Phys. 95 (2004) 5813
21. Look D.C., Reynolds D.C., Litton C.W., Jones R.L., Eason D.B., and Cantwell G. Appl. Phys. Lett. 81 (2002) 1830
22. Look D.C., Reynolds D.C., Hemsky J.W., Jones R.L., and Sizelove J.R. Appl. Phys. Lett. 75 (1999) 811
23. Khanna R., Ip K., Allums K., Baik K., Abernathy C.R., Pearton S.J., Heo Y.W., Norton D.P., Ren F., Shojah-Ardalan S., and Wilkins R. J. Electron. Mater. 34 (2005) 395
24. Gruber T., Kirschner C., Kling R., Reuss F., Waag A., Bertram F., Forster D., Christen J., and Schreck M. Appl. Phys. Lett. 83 (2003) 3290
25. Takeuchi I., Yang W., Chang K.-S., Aronova M.A., Venkatesan T., Vispute R.D., and Bendersky L.A. J. Appl. Phys. 94 (2003) 7336
26. Swanson G.D., Tanagawa T., and Polla D.L. Electrochem. Soc. Ext. Abstr. 90-2 (1990) 1082
27. Lee J.-M., Chang K.-M., Kim K.-K., Choi W.-K., and Park S.J. J. Electrochem. Soc. 148 (2001) G1
28. Hiramatsu M., Imaeda K., Horio N., and Nawata M. J. Vac. Sci. Technol. A 16 (1998) 669
29. Lee J.-M., Kim K.-K., Park S.-J., and Park W.-K. Appl. Phys. Lett. 78 (2001) 3842
30. Lee J.-M., Chang K.-M., Kim K.-K., Choi W.-K., and Park S.J. J. Electrochem. Soc. 148 (2001) G1
31. Ip K., Baik K.H., Overberg M.E., Lambers E.S., Heo Y.W., Norton D.P., Pearton S.J., Ren F., and Zavada J.M. Appl. Phys. Lett. 81 (2002) 3546
32. Kim H.-K., Bae J.W., Kim T.-K., Kim K.-K., Seong T.-Y., and Adesida I. J. Vac. Sci. Technol. B 21 (2003) 1273
33. Stafford L., Margot J., Chaker M., and Pearton S.J. Appl. Phys. Lett. 87 (2005) 071502
34. Steinbruchel C. Appl. Phys. Lett. 55 (1989) 1960
35. Heo Y.W., Norton D.P., and Pearton S.J. J. Appl. Phys. 98 (2005) 073502