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Volumn 21, Issue 4, 2003, Pages 1273-1277

Inductively coupled plasma reactive ion etching of ZnO using BCl 3-based plasmas

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; ATOMIC FORCE MICROSCOPY; AUGER ELECTRON SPECTROSCOPY; INDUCTIVELY COUPLED PLASMA; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY; STOICHIOMETRY;

EID: 0141793154     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper
Times cited : (61)

References (20)
  • 1
    • 0030913555 scopus 로고    scopus 로고
    • Washington, DC, U.S.
    • R. F. Service, Science (Washington, DC, U.S.) 276, 895 (1997).
    • (1997) Science , vol.276 , pp. 895
    • Service, R.F.1
  • 11
    • 0141561216 scopus 로고    scopus 로고
    • NISI database http://www.nist.gov/public_affairs/database.htm
    • NISI Database
  • 13
    • 84863333158 scopus 로고
    • Standard thermodynamic properties of chemical substances
    • edited by D. R. Lide (Chemical Rubber Corp., Boca Raton, FL)
    • D. R. Lide, Standard thermodynamic properties of chemical substances, in CRC Handbook of Chemistry and Physics, 73rd ed., edited by D. R. Lide (Chemical Rubber Corp., Boca Raton, FL, 1992).
    • (1992) CRC Handbook of Chemistry and Physics, 73rd Ed.
    • Lide, D.R.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.