Dry etching of ZnO using an inductively coupled plasma

Journal of the Electrochemical Society

Volumn 148, Issue 1, 2001, Pages

  Lee, Ji Myon ^a,b   Chang, Ki Myung ^a   Kim, Kyoung Kook ^a   Choi, Won Kook ^a   Park, Seong Ju ^a  

^a Gwangju Institute of Science and Technology (GIST)   (South Korea)

^b Korea Institute of Science and Technology   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; DRY ETCHING; EMISSION SPECTROSCOPY; GASES; HYDROGEN; INDUCTIVELY COUPLED PLASMA; MAGNETRON SPUTTERING; METHANE; PHOTOLUMINESCENCE; PLASMA DENSITY; SCANNING ELECTRON MICROSCOPY;

RADIO FREQUENCY TABLE POWER;

ZINC OXIDE;

EID: 0035126364     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1344554     Document Type: Article

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