Diode laser measurements of CFx species in a low-pressure, high-density plasma reactor

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 20, Issue 5, 2002, Pages 1603-1610

  Littau, M E ^a   Sowa, M J ^a   Cecchi, J L ^a  

^a University of New Mexico   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; CHEMICAL REACTORS; ETCHING; FLUOROCARBONS; HELIUM NEON LASERS; INDUCTIVELY COUPLED PLASMA; INFRARED RADIATION; LIGHT ABSORPTION; RADIATION DETECTORS; THREE TERM CONTROL SYSTEMS;

WAVELENGTH MODULATION;

SEMICONDUCTOR LASERS;

EID: 0036748646     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1495510     Document Type: Article

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