Topographical and chemical surface modification of porous MSQ using silylating agents with different numbers of methoxy groups

Materials Research Society Symposium Proceedings

Volumn 914, Issue , 2006, Pages 265-271

  Smith, Casey ^a   Mueller, Dennis ^a   Matz, Phil ^b   Reidy, Rick ^a  

^a UNIVERSITY OF NORTH TEXAS   (United States)

^b TEXAS INSTRUMENTS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; ATOMIC FORCE MICROSCOPY; CONTACT ANGLE; DIELECTRIC MATERIALS; PERMITTIVITY; SURFACE TOPOGRAPHY; SURFACE TREATMENT;

ALKOXIDE SILYLATION AGENTS; GRAZING ANGLE ATTENUATED TOTAL REFLECTION (GATR); INTERLAYER DIELECTRIC MATERIALS (ILD); METHYLSILSESQUIOXANE (MSQ);

PLASMA APPLICATIONS;

EID: 33749646193     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-0914-f04-04     Document Type: Conference Paper

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