Dehydration after plasma oxidation of porous low-dielectric-constant spin-on-glass films

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 39, Issue 7 A, 2000, Pages 3919-3923

  Kondoh, Eiichi ^a   Asano, Tanemasa ^a   Arao, Hiroki ^b   Nakashima, Akira ^b   Komatsu, Michio ^b  

^a KYUSHU INSTITUTE OF TECHNOLOGY   (Japan)

^b Catalysts and Chemicals Ind Co Ltd   (Japan)

Author keywords

HMDS; Low dielectric constant material; Plasma; Spin on glass

Indexed keywords

COATING TECHNIQUES; DEHYDRATION; GLASS; ORGANIC COMPOUNDS; OXIDATION; OXYGEN; PERMITTIVITY; PLASMAS; POROSITY; POROUS MATERIALS; SILICON WAFERS;

HEXADIMETHYLDISILAZANE; HYDROPHOBICITY; LOW DIELECTRIC CONSTANT MATERIAL; PLASMA OXIDATION; SPIN ON COATING; SPIN ON GLASS FILMS;

DIELECTRIC FILMS;

EID: 0034215919     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.3919     Document Type: Article

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