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Volumn 228, Issue 1, 2000, Pages 157-170
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Mechanism and kinetics of hexamethyldisilazane reaction with a fumed silica surface
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Author keywords
Kinetics; Mechanism; Silica surfaces; Silylation reaction
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Indexed keywords
SILANE DERIVATIVE;
SILICON DIOXIDE;
TOLUENE;
ADSORPTION;
ARTICLE;
CHEMICAL REACTION;
CHEMICAL REACTION KINETICS;
COMPUTER PROGRAM;
FUME;
HYDROGEN BOND;
INFRARED SPECTROSCOPY;
PRIORITY JOURNAL;
QUANTUM MECHANICS;
SURFACE PROPERTY;
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EID: 0034255963
PISSN: 00219797
EISSN: None
Source Type: Journal
DOI: 10.1006/jcis.2000.6934 Document Type: Article |
Times cited : (97)
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References (49)
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