Formation mechanisms and properties of semifluorinated molecular gradients on silica surfaces

Langmuir

Volumn 22, Issue 20, 2006, Pages 8532-8541

  Genzer, Jan ^a   Efimenko, Kirill ^a   Fischer, Daniel A ^b  

^a North Carolina State University   (United States)

^b NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MOLECULAR GRADIENTS; SFO MOLECULES; SILICA SURFACES; X-RAY ABSORPTION;

CONCENTRATION (PROCESS); MOLECULAR ORIENTATION; MONOLAYERS; SILICA; SURFACE CHEMISTRY; X RAY ANALYSIS;

MOLECULAR DYNAMICS;

EID: 33749606383     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la061016r     Document Type: Article

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