Fabricating planar nanoparticle assemblies with number density gradients

Langmuir

Volumn 18, Issue 15, 2002, Pages 5640-5643

  Bhat, Rajendra R ^a   Fischer, Daniel A ^b   Genzer, Jan ^a  

^a North Carolina State University   (United States)

^b NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ASSEMBLY; ATOMIC FORCE MICROSCOPY; COLLOIDS; GOLD; LIGHT ABSORPTION; MOLECULAR DYNAMICS; SILANES; SILICA; VAPOR DEPOSITION;

MICROGRAPHS;

NANOSTRUCTURED MATERIALS;

EID: 0037162588     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la025524m     Document Type: Article

References (35)

1. Feynman, R.P. Eng. Sci. 1960, 23, 22. (A copy of this famous talk is also available on the Internet at http://www.zyvex.com/nanotech/feynman.html.).
2. Engineering a smaller world: From atomic manipulation to microfabrication. A special issue in Science 1991, 254, 1277. Rao, C.N.R.; Cheetham, A.K. J. Mater. Chem. 2001, 11, 2887.
3. Engineering a smaller world: From atomic manipulation to microfabrication. A special issue in Science 1991, 254, 1277. Rao, C.N.R.; Cheetham, A.K. J. Mater. Chem. 2001, 11, 2887.
4. Wohltjen, H.; Snow, A.W. Anal. Chem. 1998, 70, 2856.
5. Oregan, B.; Gratzel, M. Nature 1991, 353, 737.
6. Nie, S.; Emory, S.R. Science 1997, 275, 1102.
7. Colvin, V.L.; Schlamp, M.C.; Alivisatos, A.P. Nature 1994, 370, 354.
8. Shipway, A.N.; Katz, E.; Willner, I. Chem Phys Chem 2000, 1, 18.
9. Service, R.F. Science 1997, 275, 303.
10. Ross, C. Annu. Rev. Mater. Res. 2001, 31, 203.
11. Kotov, N.A.; Dekany, I.; Fendler, J.H. J. Phys. Chem. 1995, 99, 13065.
12. Grabar, K.C.; Freeman, R.G.; Hommer, M.B.; Natan, M.J. Anal. Chem. 1995, 67, 735.
13. Grabar, K.C.; Smith, P.C.; Musick, M.D.; Davis, J.A.; Walter, D.G.; Jackson, M.A.; Guthrie, A.P.; Natan, M.J. J. Am. Chem. Soc. 1996, 118, 1148.
14. Xia, Y.; Whitesides, G.M. Annu. Rev. Mater. Sci. 1998, 28, 153; Xia, Y.; Whitesides, G.M. Angew. Chem., Int. Ed. Engl. 1998, 37, 550. Xia, Y.; et al. Chem. Rev. 1999, 99, 1823.
15. Xia, Y.; Whitesides, G.M. Annu. Rev. Mater. Sci. 1998, 28, 153; Xia, Y.; Whitesides, G.M. Angew. Chem., Int. Ed. Engl. 1998, 37, 550. Xia, Y.; et al. Chem. Rev. 1999, 99, 1823.
16. Xia, Y.; Whitesides, G.M. Annu. Rev. Mater. Sci. 1998, 28, 153; Xia, Y.; Whitesides, G.M. Angew. Chem., Int. Ed. Engl. 1998, 37, 550. Xia, Y.; et al. Chem. Rev. 1999, 99, 1823.
17. He, H.X.; Zhang, H.; Li, Q.G.; Li, S.F.Y.; Liu, Z.F. Langmuir 2000, 16, 3846.
18. Vossmeyer, T.; DeIonno, E.; Heath, J.R. Angew. Chem., Int. Ed. 1997, 36, 1080.
19. Sato, T.; Hasko, D.G.; Ahmed, H. J. Vac. Sci. Technol., B 1997, 15, 45.
20. Baker, B.E.; Kline, N.J.; Trendo, P.J.; Natan, M.J. J. Am. Chem. Soc. 1996, 118, 8721.
21. Frens, G. Nat. Phys. Sci. 1973, 241, 20.
22. Certain commercial equipment is identified in this article in order to specify adequately the experimental procedure. In no case does such identification imply recommendation or endorsement by the National Institute of Standards and Technology, nor does it imply that the items identified are necessarily the best available for the purpose.
23. Stöhr, J. NEXAFS Spectroscopy; Springer-Verlag: Berlin, 1992.
24. For detailed information about the NIST/Dow Soft X-ray Materials Characterization Facility at NSLS BNL, see: http://nslsweb.nsls.bnl.gov/nsls/pubs/newsletters/96-nov.pdf and Genzer, J. et al. Langmuir 2000, 16, 1993; Macromolecules 2000, 33, 1882.
25. For detailed information about the NIST/Dow Soft X-ray Materials Characterization Facility at NSLS BNL, see: http://nslsweb.nsls.bnl.gov/nsls/pubs/newsletters/96-nov.pdf and Genzer, J. et al. Langmuir 2000, 16, 1993; Macromolecules 2000, 33, 1882.
26. Ruardy, T.G.; Schakenraad, J.M.; VanderMei, V.C.; Busscher, H.J. Surf. Sci. Rep. 1997, 29, 3.
27. Chaudhury, M.K.; Whitesides, G.M. Science 1992, 256, 1539.
28. Fuierer, R.R.; Carroll, R.L.; Feldheim, D.L.; Gorman, C.B. Adv. Mater. 2002, 14, 154.
29. We note, however, that recent work in our group (Efimenko, K.; Genzer, J. Unpublished results.) indicates that the process is more complicated. In a simple picture, one has to realize that the gradient growth is governed by at least three processes: diffusion in the vapor, diffusion along the substrate, and reaction with the surface anchor.
30. Efimenko, K.; Genzer, J. Adv. Mater. 2001, 13, 1560.
31. Grabar, K.C.; Allison, K.J.; Baker, B.E.; Bright, R.M.; Brown, K.R.; Freeman, R.G.; Keating, C.D.; Musick, M.D.; Natan, M.J. Langmuir 1996, 12, 2353.
32. Zhu, T.; Fu, X.Y.; Mu, T.; Wang, J.; Liu, Z.F. Langmuir 1999, 15, 5197.
33. Handley, D.A. In Colloidal Gold: Principles, Methods and Applications; Hayat, M.A., Ed.; Academic Press: San Diego, CA, 1989; Vol. 1, Chapter 1.
34. 2 and the scan step size in the x direction was 0.5 mm.
35. A comparison of the number density profiles of gold nanoparticles in the double and single gradients reveals that while the lengths of the gradient are the same, the number density of the gold nanoparticles in the double gradient is about half the corresponding value in the single gradient case. As illustrated by the NEXAFS data in Figure 2, this behavior is a consequence of a lower concentration of the APTES molecules grafted on the substrate.