Molecular orientation and grafting density in semifluorinated self-assembled monolayers of mono-, di-, and trichloro silanes on silica substrates

Langmuir

Volumn 18, Issue 24, 2002, Pages 9307-9311

  Genzer, Jan ^a   Efimenko, Kirill ^a   Fischer, Daniel A ^b  

^a North Carolina State University   (United States)

^b NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; FLUOROCARBONS; GRAFTING (CHEMICAL); MATHEMATICAL MODELS; MOLECULAR ORIENTATION; SELF ASSEMBLY; SILANES; SILICA; SUBSTRATES; VAPOR DEPOSITION; X RAY SPECTROSCOPY;

GRAFTING DENSITY; NEAR EDGE X RAY ABSORPTION FINE STRUCTURE; TRICHLOROORGANOSILANES;

MONOLAYERS;

EID: 0037180632     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la025921x     Document Type: Article

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