Low-Temperature Deposition of Aluminum Oxide on Polyethersulfone Substrate Using Plasma-Enhanced Atomic Layer Deposition

Electrochemical and Solid-State Letters

Volumn 7, Issue 1, 2004, Pages

  Yun, Sun Jin ^a   Lim, Jung Wook ^a   Lee, Jin Ho ^a  

^a Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; DIELECTRIC MATERIALS; LIGHT EMITTING DIODES; OPTICAL DEVICES; PLASMAS; POLYETHERS; SUBSTRATES; THERMAL EFFECTS; THIN FILM TRANSISTORS;

PLASMA-ENHANCED ATOMIC LAYER DEPOSITION (PEALD); PLASTIC SUBSTRATES;

ALUMINUM COMPOUNDS;

EID: 0942266985     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1628666     Document Type: Article

References (8)

1. P. G. Carey, P. M. Smith, S. D. Thesis, and P. Wickboldt, J. Vac. Sci. Technol. A, 17, 1946 (1999).
2. P. M. Smith, P. G. Carey, and T. W. Sigmon, Appl. Phys. Lett., 70, 342 (1997).
3. S. H. Ko Park, J. I. Lee, Y. S. Yang, and S. I. Yun, in Proceeding of the 2nd International Meeting on Information Display 2002, p. 746 (2002).
4. J. W. Lim and S. J. Yun, Jpn. J. Appl. Phys., Part 2, 42, L663 (2003).
5. S. J. Yun, K.-H. Lee, J. Skarp, H.-R. Lim, and K.-S. Nam, J. Vac. Sci. Technol. A, 15, 2993 (1997).
6. D. P. Gosain, T. Noguchi, and S. Usui, Jpn. J. Appl. Phys., Part 2, 39, L179 (2000).
7. S. K. Park, J. I. Han, D. G. Moon, and W. K. Kim, Jpn. J. Appl Phys., Part 1, 42, 623 (2003).
8. J. Yu, J. G. Kim, J. O. Chung, and D. H. Cho, J. Appl. Phys., 88, 1688 (2000).