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Diamond and Related Materials

Volumn 11, Issue 3-6, 2002, Pages 1172-1177

Properties of carbon nitride (CNx) films deposited by a high-density plasma ion plating method

(3) Chen, Liang Yih a Cheng, Chiao Yang a Chau Nan Hong, Franklin a

a NATIONAL CHENG KUNG UNIVERSITY (Taiwan)

Author keywords

Carbon nitride; Internal stress; Optical emission spectroscopy; Raman

Indexed keywords

CARBON NITRIDE; DEPOSITION; DISSOCIATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; NITROGEN; PLASMAS; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY;

HOLLOW CATHODE ARC (HCA); OPTICAL EMISSION SPECTRA (OES);

THIN FILMS;

CARBON NITRIDE; FILM; HARDNESS; MECHANICAL PROPERTY; SPECTROSCOPY; STRESS;

EID: 0036508083 PISSN: 09259635 EISSN: None Source Type: Journal
DOI: 10.1016/S0925-9635(01)00583-0 Document Type: Article

Times cited : (13)

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