Improvement of the thermal stability of amorphous carbon films by incorporation of nitrogen

Thin Solid Films

Volumn 353, Issue 1, 1999, Pages 157-165

  Bai, H L ^a,b   Jiang, E Y ^a  

^a TIANJIN UNIVERSITY   (China)

^b TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; BONDING; CARBON; ELECTRIC CONDUCTIVITY MEASUREMENT; GRAPHITIZATION; NITROGEN; RAMAN SPECTROSCOPY; SPUTTERING; THERMODYNAMIC STABILITY; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

DUAL FACING TARGET SPUTTERING; RAMAN MEASUREMENTS; SOFT X RAY MULTILAYERS;

AMORPHOUS FILMS;

EID: 0033327657     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00421-6     Document Type: Article

References (11)

1. Spiller E. Dhez P., Weisbuch C. Physics, Fabrication, and Application of Multilayered Structures. 1987;271 Plenum Press, New York.
2. Underwood J.H., Barbee T.W. Jr. Nature. 294:1981;429.
3. Nagata H., Seki S. Jpn. J. Appl. Phys. 1:(29):1990;569.
4. Arbaoui M., Barchewitz R., Sella C., Youn K.B. Appl. Opt. 29:1990;477.
5. Bai H.L., Jiang E.Y., Wang C.D. Appl. Phys. A. 63:1996;57.
6. Zieger E., Lepetre Y., Joksch S., et al. Rev. Sci. Instrum. 60:1989;1999.
7. Bai H.L., Jiang E.Y., Wang C.D. J. Appl. Phys. 80:(3):1996;1428.
8. Lodha G.S., Pandita S., Gupta A., Nandedkar R.V., Yamashita K. Appl. Phys. A. 62:1996;29.
9. Bai H.L., Jiang E.Y., Wang C.D., Tian R.Y. J. Appl. Phys. 82:(5):1997;2270.
10. Robertson J., O'Reilly E.P. Phys. Rev. B. 27:1987;3760.
11. Beeman D., Silverman J., Lynds R., Anderson M.R. Phys. Rev. B. 30:1984;870.