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Volumn 483, Issue 1-2, 2005, Pages 169-174

Study on amorphous carbon nitride film prepared by facing target sputtering

Author keywords

Amorphous carbon nitride; Facing target sputtering; Raman scattering; X ray photoelectron spectroscopy (XPS)

Indexed keywords

AMORPHOUS FILMS; ATOMIC FORCE MICROSCOPY; CARBON NITRIDE; DEPOSITION; GAS METERS; MORPHOLOGY; RAMAN SCATTERING; SURFACES; SYNTHESIS (CHEMICAL); TARGETS; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 18844409589     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.01.019     Document Type: Article
Times cited : (36)

References (42)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.