Structural changes of Y2O3 and La2O 3 films by heat treatment

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 8 A, 2006, Pages 6196-6202

  Yamamoto, Takashi ^a   Izumi, Yukiko ^a   Hashimoto, Hideki ^a   Oosawa, Masanori ^b   Sugita, Yoshihiro ^c  

^a TORAY RESEARCH CENTER INC   (Japan)

^b TAIYO NIPPON SANSO CORPORATION   (Japan)

^c FUJITSU LABORATORIES LTD   (Japan)

Author keywords

FT IR ATR; High k; Interface reaction; Rare earth oxide; SIMS; XPS

Indexed keywords

FOURIER TRANSFORM INFRARED SPECTROSCOPY; HEAT TREATMENT; LANTHANUM COMPOUNDS; OXIDATION; SECONDARY ION MASS SPECTROMETRY; SILICON; SUBSTRATES; X RAY PHOTOELECTRON SPECTROSCOPY;

HIGH-K; INTERFACE REACTION; LOW PRESSURE CHEMICAL VAPOR DEPOSITION (LPCVD); RARE EARTH OXIDE;

YTTRIUM COMPOUNDS;

EID: 33748580416     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.6196     Document Type: Article

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