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Volumn 47, Issue 6, 2003, Pages 1021-1025

Rapid post-metallization annealing effects on high-k Y2O3/Si capacitor

Author keywords

Post metallization annealing; Si; XPS; Y2O3

Indexed keywords

CHEMICAL BONDS; ELECTRIC CHARGE; ELECTRIC POTENTIAL; INTERFACES (MATERIALS); METALLIZING; PHOTOELECTRON SPECTROSCOPY; RAPID THERMAL ANNEALING;

EID: 0037409003     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0038-1101(02)00467-7     Document Type: Article
Times cited : (9)

References (9)
  • 8


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.