Baking study of fluorinated 157 nm resist

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5039 I, Issue , 2003, Pages 641-649

  Houlihan, Francis ^a   Sakamuri, Raj ^a   Romano, Andrew ^a   Dammel, Ralph R ^a   Conley, Will ^b   Rich, Georgia ^b   Miller, Daniel ^b   Rhodes, Larry ^c   McDaniels, Joe ^c   Chang, Chun ^c  

^a CLARIANT CORPORATION   (United States)

^b SEMATECH   (United States)

^c Promerus LLC   (United States)

Author keywords

157 nm; Bake study; Resist

Indexed keywords

ACIDS; DIFFUSION; EROSION; FLUORINE CONTAINING POLYMERS; IMAGE QUALITY; POLYMER BLENDS; STATISTICAL METHODS; THERMAL EFFECTS;

CLEARING DOSE; DARK EROSION; FLUORINATED RESISTS; POST APPLIED BAKE; POST EXPOSURE BAKE; STATISTICAL DESIGN;

PHOTORESISTS;

EID: 0141497064     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485196     Document Type: Conference Paper

References (8)

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6. Shun-ichi Kodama, Isamu Kaneko, Yoko Takebe, Shinji, Okada, Yasuhide, Kawaguchi, Naomi Schida, Seiichi Ishikawa, Minoru Toriumi, Toshiro Itani, Advances in Resist Technology and Processing XIX, Proceedings of SPIE 4690 p 76 (2002).
7. Ralph. Dammel, Raj Sakamuri, Andrew Romano, Richard Vicari, Cheryl Hacker, Will Conley and Daniel Miller, Advances in Resist Technology and Processing XVII, Proceedings of SPIE Vol 44345 p 351 (2001).
8. Francis Houlihan, Andrew Romano, Raj Sakamuri, Ralph R. Dammel, Will Conley, Georgia Rich, Daniel Miller, Larry Rhodes, Joe McDaniels, and ChunChang Advances in Resist Technology and Processing XX, Proceedings of SPIE 2003, in press.