Fundamental studies of acid-breakable resins for chemical-amplification positive resist matrices

Journal of Photopolymer Science and Technology

Volumn 14, Issue 4, 2001, Pages 523-530

  Arai, Tadashi ^a   Migitaka, Sonoko ^a   Sakamizu, Toshio ^a   Kasuya, Kei ^b   Hashimoto, Michiaki ^b   Shiraishi, Hiroshi ^a  

^a HITACHI LTD   (Japan)

^b High Performance Materials Department   (Japan)

Author keywords

Acid breakable resin; Chemical amplification; Inhomogeneous distribution; Positive resist

Indexed keywords

ETHER DERIVATIVE; POLYPHENOL; RESIN; VINYL DERIVATIVE;

ARTICLE; CATALYSIS; CHEMICAL REACTION; CHEMICAL STRUCTURE; GEL PERMEATION CHROMATOGRAPHY; INFRARED SPECTROSCOPY; LIQUID CHROMATOGRAPHY; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; SYNTHESIS;

EID: 0035747136     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.14.523     Document Type: Article

References (15)