Site-specific SIMS backside analysis

Applied Surface Science

Volumn 231-232, Issue , 2004, Pages 663-667

  Gu, C ^a   Garcia, R ^a   Pivovarov, A ^a   Stevie, F ^a   Griffis, D ^a  

^a NORTH CAROLINA STATE UNIVERSITY   (United States)

Author keywords

Backside analysis; Patterned wafers; Semiconductors; SIMS

Indexed keywords

ETCHING; ION IMPLANTATION; POLISHING; PROFILOMETRY; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTOR MATERIALS; SILICON WAFERS; SPUTTERING; SUBSTRATES; SURFACE TREATMENT;

BACKSIDE ANALYSIS; DEPTH PROFILING; ION BEAM MIXING; PRIMARY IONS;

SURFACE CHEMISTRY;

EID: 2942525400     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2004.03.140     Document Type: Conference Paper

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