Growth of high-quality homoepitaxial CVD diamond films at high growth rate

Journal of Crystal Growth

Volumn 235, Issue 1-4, 2002, Pages 287-292

  Teraji, Tokuyuki ^a   Mitani, Satoshi ^a   Wang, Chunlei ^a   Ito, Toshimichi ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

A1. Characterization; A1. Crystal morphology; A3. Chemical vapor deposition processes; A3. Homoepitaxial growth; B1. Diamond; B2. Semiconducting materials

Indexed keywords

CATHODOLUMINESCENCE; CRYSTALLINE MATERIALS; EPITAXIAL GROWTH; FILM GROWTH; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THERMAL EFFECTS;

HOMOEPITAXIAL GROWTH;

DIAMOND FILMS;

EID: 0036467098     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(01)01802-4     Document Type: Article

References (14)