Ultra-short pulsed laser deposition and patterning of SiC thin films for MEMS fabrication

Materials Science in Semiconductor Processing

Volumn 8, Issue 6, 2005, Pages 630-645

  Vendan, Monica ^a   Molian, Pal ^a   Bastawros, Ashraf ^a   Anderegg, James ^b  

^a Iowa State University of Science and Technology   (United States)

^b U S DEPARTMENT OF ENERGY   (United States)

Author keywords

Ablation; Actuator; Chemical vapor deposition; Micro electro mechanical systems; Pulsed laser deposition; Semiconductor; Silicon carbide; Thin film

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; LASER ABLATION; LASER PRODUCED PLASMAS; MICROELECTROMECHANICAL DEVICES; PULSED LASER DEPOSITION; SCANNING ELECTRON MICROSCOPY; SILICON CARBIDE; SINGLE CRYSTALS; SPUTTERING; STOICHIOMETRY; VACUUM APPLICATIONS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

ACTUATOR; MEMS FABRICATION; MICRO-ELECTRO-MECHANICAL SYSTEMS; NANOINDENTATION; ULTRA-HIGH VACUUM CHAMBER;

THIN FILMS;

EID: 33747044711     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mssp.2006.02.002     Document Type: Article

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