Characterization of crystalline SiC films grown by pulsed laser deposition

Thin Solid Films

Volumn 371, Issue 1, 2000, Pages 72-79

  Pelt, Jamey S ^a   Ramsey, Matthew E ^a   Durbin, Steven M ^a,b  

^a FLORIDA A AND M UNIVERSITY   (United States)

^b CANTERBURY CHRIST CHURCH UNIVERSITY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; DEPOSITION; FILM GROWTH; HIGH TEMPERATURE SUPERCONDUCTORS; OXIDE SUPERCONDUCTORS; PULSED LASER APPLICATIONS; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SAPPHIRE; SILICON CARBIDE; SINGLE CRYSTALS; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

PULSED LASER DEPOSITION (PLD);

SUPERCONDUCTING FILMS;

EID: 0033689807     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)00991-3     Document Type: Article

References (28)

1. Metev S., Meteva K. Appl. Surf. Sci. 43:1989;402.
2. Hubler G.K. Chrisey D.B., Hubler G.K. Pulsed Laser Deposition of Thin Films. 1994;327 John Wiley and Sons Inc, New York.
3. Taylor M.E., Atwater H.A. Appl. Surf. Sci. 127-129:1998;159.
4. Wang Y., Wen J., Guo Z., Tang Y., Tang H., Wu J. Thin Solid Films. 338:1999;93.
5. Nainaparampil J.J., Zabinski J.S. J. Vac. Sci. Technol. A17:1999;909.
6. Rimai L., Ager R., Weber W.H., Hangas J., Samman A., Zhu W. J. Appl. Phys. 77:1995;6601.
7. Diegel M., Falk F., Hergt R., Hobert H., Stafast H. Appl. Phys. A66:1998;183.
8. Reitano R., Baeri P. Europhys. Lett. 43:1998;565.
9. Rimai L., Ager R., Weber W.H., Hangas J., Poindexter B.D. Appl. Phys. Lett. 65:1994;2171.
10. Neri F., Trusso S., Vasi C., Barreca F., Valisa P. Thin Solid Films. 332:1998;290.
11. Capano M.A., Walck S.D., Murray P.T., Dempsey D., Grant J.T. Appl. Phys. Lett. 64:1994;3413.
12. Balooch M., Tench R.J., Siekhaus W.J., Allen M.J., Connor A.L., Olander D.R. Appl. Phys. Lett. 57:1990;1540.
13. Capano M.A. J. Appl. Phys. 78:1995;4790.
14. Zehnder T., Blatter A., Bächli A. Thin Solid Films. 241:1994;138.
15. Reitano R., Baeri P., Marino N. Appl. Surf. Sci. 96-98:1996;302.
16. Leggieri G., Luches A., Martino M., Perrone A., Alexandrescu R., Barborica A., Gyorgy E., Mihailescu I.N., Majni G., Mengucci P. Appl. Surf. Sci. 96-98:1996;866.
17. Nakamatsu H., Kawai S. Emin D., Aselage T.L., Wood C. Novel Refractory Semiconductors Symposium, Anaheim, USA; 21-23 April 1987, Mater. Res. Soc. Symp. Proc. 97. 1987;189.
18. Sankur H., Gunning W.J., DeNatale J., Flintoff J.F. J. Appl. Phys. 65:1989;2475.
19. Nishino S., Saraie J. Rahman M.M., Yang C.Y.-W., Harris G.L. Amorphous and Crystalline Silicon Carbide II, Santa Clara, USA; 15-16 Dec. 1988, Springer Proceedings in Physics 43. 1989;8.
20. Lundquist P.M., Ong H.C., Lin W.P., Chang R.P.H., Ketterson J.B., Wong G.K. Appl. Phys. Lett. 67:1995;2919.
21. Wang Y., Tang Y., Chen W., Cai W., Tang H. Physica B. 228:1996;397.
22. Ohring M. The Materials Science of Thin Films. 1992;95 Academic Press, San Diego.
23. El Khakani M.A., Gat E., Beaudoin Y., Chaker M., Monteil C., Guay D., Létourneau G., Pépin H. Laser-Induced Thin Film Processing, San Jose, USA; 8-10 Feb., 1995. SPIE Proc. 2403:1995;153.
24. Wee A.T.S., Li K., Tin C.C. Appl. Surf. Sci. 126:1998;34.
25. Romanus H., Cimalla V., Kromka A., Scheiner J., Spieß L., Pezoldt J. Mat. Sci. Eng. B47:1997;274.
26. Barsoum M.W. Fundamentals of Ceramics. 1997;401 McGraw-Hill, New York.
27. Xiaodong L., Bhushan B. Thin Solid Films. 340:1999;210.
28. Woirgard J., Cabioc'h T., Riviere J.P., Dargenton J.C. Surf. Coat. Tech. 100-101:1998;128.