Optical characterization of pulsed laser deposited SiC films

Applied Surface Science

Volumn 154, Issue , 2000, Pages 83-88

  Schlaf, M ^a   Sands, D ^a   Key, P H ^a  

^a UNIVERSITY OF HULL   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL STRUCTURE; DEPOSITION; FUSED SILICA; LIGHT REFLECTION; LIGHT TRANSMISSION; MATHEMATICAL MODELS; PULSED LASER APPLICATIONS; SILICON CARBIDE; SILICON WAFERS; SIMULATED ANNEALING; THIN FILMS;

PULSED LASER DEPOSITION (PLD);

OPTICAL FILMS;

EID: 0033902280     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(99)00410-9     Document Type: Article

References (15)

1. Dreike P.L., Fleetwood D.M., King D.B., Sprauer D.C., Zipperian T.E. IEET Trans. Compon., Packag., Manuf. Technol., Part A. 17:1994;594.
2. Zang W., Richter M., Solomon P., Kostoulas Y., Kneissl G., Aarts W., Waldhauer A. Solid State Technol. 10:1998;S5.
3. Franke J.E., Niemczyk T.M. Spectrochim. Acta, Part A. 50:1994;1687.
4. Dyer P.E., Issa A., Key P.H., Monk P. Supercond. Sci. Technol. 3:1990;472.
5. Mott N.F., Davis E.A. Electronic processes in non-crystalline materials. 1979;Clarendon Press, Oxford.
6. Harbecke B. Appl. Phys. B. 39:1986;165.
7. Mitra S.S. Palik E.D. Handbook of Optical Constants of Solids. 1985;213 Academic Press, New York.
8. Grosse P., Harbecke B., Heinz B., Meyer R., Offenberg M. Appl. Phys. A. 39:1986;257.
9. van Laarhoven P.J.M., Aarts E.H.L. Simulated Annealing: Theory and Applications. 1987;Reidel, Dordrecht.
10. Rimai L., Ager R., Hangas J., Logothetis E.M., Abu-Ageel N., Aslam M. J. Appl. Phys. 73:1993;8242.
11. El Khakani M.A., Chaker M., O'Hern M.E., Oliver W.C. J. Appl. Phys. 82:1997;4310.
12. Mott N.F., Davis E.A. Electronic Processes in Non-Crystalline Materials. 1979;Clarendon Press, Oxford.
13. Holm R.T., Klein P.H., Nordquist P.E.R. Jr. J. Appl. Phys. 60:1986;1479.
14. Spitzer W.G., Kleinmann D.A., Frosch C.J. Phys. Rev. 113:1959;133.
15. Kucírková A., Navrátil K. Appl. Spectrosc. 48:1994;113.