Pulsed laser deposition of ZnO thin films using a femtosecond laser

Applied Surface Science

Volumn 154, Issue , 2000, Pages 424-427

  Okoshi, Masayuki ^a   Higashikawa, Kouji ^a   Hanabusa, Mitsugu ^a  

^a TOYOHASHI UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CONDUCTIVE FILMS; DEPOSITION; ELECTRIC CONDUCTIVITY; OPTICAL FILMS; PULSED LASER APPLICATIONS; QUARTZ; SILICON WAFERS; THIN FILMS; TRANSPARENCY; ULTRAFAST PHENOMENA; X RAY DIFFRACTION ANALYSIS;

PULSED LASER DEPOSITION (PLD);

ZINC OXIDE;

EID: 0033885155     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(99)00392-X     Document Type: Article

References (13)

1. van de Pol F.C.M. Ceram. Bull. 69:1990;1959.
2. Z. Liu, M.Watanabe, M. Hanabusa, Thin Solid Films, in press.
3. Chrisey D.B., Hubler G.K. Pulsed Laser Deposition of Thin Films. 1994;Wiley, New York.
4. Craciun V., Elders J., Gardeniers J.G.E., Boyd I.W. Appl. Phys. Lett. 65:1994;2963.
5. Amirhaghi S., Craciun V., Beech F., Vickers M., Tarling S., Barnes P., Boyd I.W. Mater. Res. Soc. Symp. Proc. 285:1993;489.
6. Ianno N.J., Mc Conville L., Shaikh N., Pittal S., Snyder P.G. Thin Solid Films. 220:1992;92.
7. Ogasawara M., Shimizu M., Shiosaki T. Jpn. J. Appl. Phys. 31:1992;2971.
8. Qian F., Singh R.K., Dutta S.K., Pronko P.P. Appl. Phys. Lett. 67:1995;3120.
9. Okoshi M., Higuchi S., Hanabusa M. J. Appl. Phys. 86:1999;1768.
10. Takahagi T., Nagai I., Ishitani A., Kuroda H., Nagasawa Y. J. Appl. Phys. 64:1988;3516.
11. Vig J.R. J. Vac. Sci. Technol., A. 3:1985;1027.
12. Wenas W.W., Yamada A., Takahashi K., Yoshino M., Konagai M. J. Appl. Phys. 70:1991;7119.
13. Zhang D.H., Brodie D.E. Thin Solid Films. 238:1994;95.