Femtosecond pulsed laser deposition of amorphous, ultrahard boride thin films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 22, Issue 3, 2004, Pages 670-675

  Stock, Michael ^a   Molian, Pal ^a  

^a Iowa State University of Science and Technology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON IMPURITIES; FEMTOSECOND PULSED LASER DEPOSITION; SHORT PULSED LASER BEAMS; ULTRAHARD BORIDE THIN FILMS;

ATOMIC FORCE MICROSCOPY; BORIDES; CARBON; CRYSTALLIZATION; IMPURITIES; OXYGEN; PROTECTIVE COATINGS; PULSED LASER DEPOSITION; SCANNING ELECTRON MICROSCOPY; STOICHIOMETRY; SURFACE TOPOGRAPHY; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; WEAR RESISTANCE; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS MATERIALS;

EID: 3142746995     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1722714     Document Type: Article

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