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Journal of Photopolymer Science and Technology

Volumn 19, Issue 1, 2006, Pages 65-71

Development of photoacid and photobase generators as the key materials for design of novel photopolymers

(4) Tsunooka, Masahiro a Suyama, Kanji a Okamura, Haruyuki a Shirai, Masamitsu a

a Osaka Prefecture University (Japan)

Author keywords

I line sensitive resist; Onium derivative; Oxime derivative; Photoacid generator; Photobase generator; Recycling

Indexed keywords

EID: 33746896918 PISSN: 09149244 EISSN: 13496336 Source Type: Journal
DOI: 10.2494/photopolymer.19.65 Document Type: Article

Times cited : (27)

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