I-line sensitive photoacid generators having thianthrene skeleton

Journal of Photopolymer Science and Technology

Volumn 17, Issue 1, 2004, Pages 131-134

  Okamura, Haruyuki ^a   Matsumori, Ryosuke ^a   Shirai, Masamitsu ^a  

^a Osaka Prefecture University   (Japan)

Author keywords

366 nm light; N hydroxyimide; Photoacid generator; Sulfonic acid; Thianthrene

Indexed keywords

ACID; ANTHRACENE DERIVATIVE; SULFONIC ACID DERIVATIVE; THIANTHRENE DERIVATIVE; UNCLASSIFIED DRUG;

CATALYSIS; CHEMICAL STRUCTURE; CONFERENCE PAPER; LIGHT; MATERIAL STATE; PHOTOREACTIVATION; POLYMERIZATION;

EID: 3142546860     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.17.131     Document Type: Conference Paper

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