Diphenyliodonium salts with diazoxide group for a photo-acid generator

Journal of Photopolymer Science and Technology

Volumn 17, Issue 5, 2004, Pages 719-725

  Tarumoto, Naohiro ^a   Miyagawa, Nobukazu ^b   Takahara, Shigeru ^b   Yamaoka, Tsuguo ^b  

^a Hodogaya Chemical Company   (Japan)

^b CHIBA UNIVERSITY   (Japan)

Author keywords

Chemically amplified resist; Diazoxide; Photo acid generator; Quantum yield

Indexed keywords

DIAZOXIDE; DIPHENYLIODONIUM 1 DIAZO 2 HYDROXY 6 NITRONAPHTHALENE 4 SULFONATE; DIPHENYLIODONIUM 1 DIAZO 2 HYDROXYNAPHTHALENE 4 SULFONATE; DIPHENYLIODONIUM SALT; ETHOXYETHYL DERIVATIVE; SULFONIC ACID DERIVATIVE; UNCLASSIFIED DRUG;

ABSORPTION; CHEMICAL MODIFICATION; CONFERENCE PAPER; GENERATOR; LIGHT; PHOTOACID GENERATOR; PHOTOACTIVATION; PHOTOSENSITIVITY; QUANTUM CHEMISTRY; SPECTRAL SENSITIVITY; STRUCTURE ANALYSIS; THERMOSTABILITY;

EID: 12444281679     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.17.719     Document Type: Conference Paper

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