Evaluation of Quantum Yields for Decomposition of I-Line Sensitive Photoacid Generators

Journal of Photopolymer Science and Technology

Volumn 16, Issue 5, 2003, Pages 701-706

  Okamura, Haruyuki ^a   Sakai, Koichi ^a   Tsunooka, Masahiro ^a   Shirai, Masamitsu ^a  

^a Osaka Prefecture University   (Japan)

Author keywords

I line; Oxime derivative; Photoacid generator; Quantum yield; Suifonic acid; Thermal stability

Indexed keywords

ACETONITRILE; ESTER DERIVATIVE; N HYDROXYNAPHTHALENEIMIDE; NAPHTHALENE DERIVATIVE; OXIME; POLYSTYRENE; SULFONATE ESTER DERIVATIVE; THIOXANTHENE DERIVATIVE; UNCLASSIFIED DRUG;

ABSORPTION; CONFERENCE PAPER; GENERATOR; INFRARED SPECTROSCOPY; PHOTOLYSIS; QUANTUM MECHANICS; SYNTHESIS; TEMPERATURE DEPENDENCE; THERMOSTABILITY; ULTRAVIOLET SPECTROSCOPY;

EID: 0346158273     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.16.701     Document Type: Conference Paper

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