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Journal of Photopolymer Science and Technology

Volumn 15, Issue 5, 2002, Pages 715-730

Development of novel photosensitive polymer systems using photoacid and photobase generators

(4) Shirai, Masamitsu a Suyama, Kanji a Okamura, Haruyuki a Tsunooka, Masahiro a

a Osaka City University (Japan)

Author keywords

F2 resist; Onium salt; Oxime derivative; Photoacid generator; Photobase generator; Recycling

Indexed keywords

ACID; BASE; CATION; COPOLYMER; METHACRYLONITRILE; OXIME DERIVATIVE; POLYMER; TRIFLUOROMETHANESULFONIC ACID;

CHEMICAL STRUCTURE; CROSS LINKING; DEGRADATION; PHOTOCHEMISTRY; PHOTODEGRADATION; PHOTOLYSIS; PHOTOREACTIVITY; PHOTOSENSITIVITY; REVIEW;

EID: 0038721670 PISSN: 09149244 EISSN: None Source Type: Journal
DOI: 10.2494/photopolymer.15.715 Document Type: Review

Times cited : (22)

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