Photocrosslinking system using multifunctional epoxy crosslinkers having thermally degradable properties

Journal of Polymer Science, Part A: Polymer Chemistry

Volumn 42, Issue 15, 2004, Pages 3685-3696

  Okamura, Haruyuki ^a   Shin, Kazuo ^a   Tsunooka, Masahiro ^a   Shirai, Masamitsu ^a  

^a Osaka Prefecture University   (Japan)

Author keywords

Curing of polymers; Decrosslinking; Degradation; Epoxides; In situ FT IR; Photoacid generators; Photocrosslinking; Photopolymerization; Thermal degradations

Indexed keywords

CARBOXYLIC ACIDS; CROSSLINKING; EPOXY RESINS; ESTERS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HEAT CONDUCTION; PYROLYSIS; THERMODYNAMIC STABILITY; ULTRAVIOLET RADIATION;

CURING OF POLYMERS; DECROSSLINKING; PHOTOACID GENERATORS; PHOTOCROSSLINKING;

PHOTOPOLYMERIZATION;

EID: 4043055831     PISSN: 0887624X     EISSN: None     Source Type: Journal    
DOI: 10.1002/pola.20232     Document Type: Article

References (26)

1. For recent publications on thermally or chemically degradable thermosets, see (a) Buchwalter, S. L.; Kosber, L. L. J Polym Sci Part A: Polym Chem 1996, 34, 249-260; (b) Yang, S.; Chen, J.-S.; Korner, H.; Breiner, T.; Ober, C. K. Chem Mater 1998, 10, 1475-1482; Ogino, K.; Chen, J.-S.; Ober, C. K. Chem Mater 1998, 10, 3833-3838; Wang, L.; Wong, C. P. J Polym Sci Part A: Polym Chem 1999, 37, 2991-3001; (e) Wang, D.; Lam, D. C. C. J Mater Sci Lett 2000, 19, 2109-2111; (f) Nakano, T.; Iwasa, H.; Miyagawa, N.; Takahara, S.; Yamaoka, T. J Photopolym Sci Technol 2000, 13, 715-717; (g) Wang, L.; Li, H.; Wong, C. P. J Polym Sci Part A: Polym Chem 2000, 38, 3771-3782; (h) Wang, L.; Wong, C. P. J Appl Polym Sci 2001, 81, 1868-1880; Malik, J.; Clarson, S. J. Polym Degrad Stab 2002, 76, 241-249; (j) Chen, J.-S.; Ober, C. K.; Poliks, M. D. Polymer 2002, 43, 131-139; (k) Gheneim, R.; Perez-Berumen, C.; Gandini, A. Macromolecules 2002, 35, 7246-7253; (1) Li, H. Y.; Wang, L. J.; Jacob, K.; Wong, C. P. J Polym Sci Part A: Polym Chem 2002, 40, 1796-1807; Wang, Z. G.; Xie, M. R.; Zhao, Y. F.; Yu, Y. Z.; Fang, S. B. Polymer 2003, 44, 923-929.
2. For recent publications on thermally or chemically degradable thermosets, see (a) Buchwalter, S. L.; Kosber, L. L. J Polym Sci Part A: Polym Chem 1996, 34, 249-260; (b) Yang, S.; Chen, J.-S.; Korner, H.; Breiner, T.; Ober, C. K. Chem Mater 1998, 10, 1475-1482; Ogino, K.; Chen, J.-S.; Ober, C. K. Chem Mater 1998, 10, 3833-3838; Wang, L.; Wong, C. P. J Polym Sci Part A: Polym Chem 1999, 37, 2991-3001; (e) Wang, D.; Lam, D. C. C. J Mater Sci Lett 2000, 19, 2109-2111; (f) Nakano, T.; Iwasa, H.; Miyagawa, N.; Takahara, S.; Yamaoka, T. J Photopolym Sci Technol 2000, 13, 715-717; (g) Wang, L.; Li, H.; Wong, C. P. J Polym Sci Part A: Polym Chem 2000, 38, 3771-3782; (h) Wang, L.; Wong, C. P. J Appl Polym Sci 2001, 81, 1868-1880; Malik, J.; Clarson, S. J. Polym Degrad Stab 2002, 76, 241-249; (j) Chen, J.-S.; Ober, C. K.; Poliks, M. D. Polymer 2002, 43, 131-139; (k) Gheneim, R.; Perez-Berumen, C.; Gandini, A. Macromolecules 2002, 35, 7246-7253; (1) Li, H. Y.; Wang, L. J.; Jacob, K.; Wong, C. P. J Polym Sci Part A: Polym Chem 2002, 40, 1796-1807; Wang, Z. G.; Xie, M. R.; Zhao, Y. F.; Yu, Y. Z.; Fang, S. B. Polymer 2003, 44, 923-929.
3. For recent publications on thermally or chemically degradable thermosets, see (a) Buchwalter, S. L.; Kosber, L. L. J Polym Sci Part A: Polym Chem 1996, 34, 249-260; (b) Yang, S.; Chen, J.-S.; Korner, H.; Breiner, T.; Ober, C. K. Chem Mater 1998, 10, 1475-1482; Ogino, K.; Chen, J.-S.; Ober, C. K. Chem Mater 1998, 10, 3833-3838; Wang, L.; Wong, C. P. J Polym Sci Part A: Polym Chem 1999, 37, 2991-3001; (e) Wang, D.; Lam, D. C. C. J Mater Sci Lett 2000, 19, 2109-2111; (f) Nakano, T.; Iwasa, H.; Miyagawa, N.; Takahara, S.; Yamaoka, T. J Photopolym Sci Technol 2000, 13, 715-717; (g) Wang, L.; Li, H.; Wong, C. P. J Polym Sci Part A: Polym Chem 2000, 38, 3771-3782; (h) Wang, L.; Wong, C. P. J Appl Polym Sci 2001, 81, 1868-1880; Malik, J.; Clarson, S. J. Polym Degrad Stab 2002, 76, 241-249; (j) Chen, J.-S.; Ober, C. K.; Poliks, M. D. Polymer 2002, 43, 131-139; (k) Gheneim, R.; Perez-Berumen, C.; Gandini, A. Macromolecules 2002, 35, 7246-7253; (1) Li, H. Y.; Wang, L. J.; Jacob, K.; Wong, C. P. J Polym Sci Part A: Polym Chem 2002, 40, 1796-1807; Wang, Z. G.; Xie, M. R.; Zhao, Y. F.; Yu, Y. Z.; Fang, S. B. Polymer 2003, 44, 923-929.
4. For recent publications on thermally or chemically degradable thermosets, see (a) Buchwalter, S. L.; Kosber, L. L. J Polym Sci Part A: Polym Chem 1996, 34, 249-260; (b) Yang, S.; Chen, J.-S.; Korner, H.; Breiner, T.; Ober, C. K. Chem Mater 1998, 10, 1475-1482; Ogino, K.; Chen, J.-S.; Ober, C. K. Chem Mater 1998, 10, 3833-3838; Wang, L.; Wong, C. P. J Polym Sci Part A: Polym Chem 1999, 37, 2991-3001; (e) Wang, D.; Lam, D. C. C. J Mater Sci Lett 2000, 19, 2109-2111; (f) Nakano, T.; Iwasa, H.; Miyagawa, N.; Takahara, S.; Yamaoka, T. J Photopolym Sci Technol 2000, 13, 715-717; (g) Wang, L.; Li, H.; Wong, C. P. J Polym Sci Part A: Polym Chem 2000, 38, 3771-3782; (h) Wang, L.; Wong, C. P. J Appl Polym Sci 2001, 81, 1868-1880; Malik, J.; Clarson, S. J. Polym Degrad Stab 2002, 76, 241-249; (j) Chen, J.-S.; Ober, C. K.; Poliks, M. D. Polymer 2002, 43, 131-139; (k) Gheneim, R.; Perez-Berumen, C.; Gandini, A. Macromolecules 2002, 35, 7246-7253; (1) Li, H. Y.; Wang, L. J.; Jacob, K.; Wong, C. P. J Polym Sci Part A: Polym Chem 2002, 40, 1796-1807; Wang, Z. G.; Xie, M. R.; Zhao, Y. F.; Yu, Y. Z.; Fang, S. B. Polymer 2003, 44, 923-929.
5. For recent publications on thermally or chemically degradable thermosets, see (a) Buchwalter, S. L.; Kosber, L. L. J Polym Sci Part A: Polym Chem 1996, 34, 249-260; (b) Yang, S.; Chen, J.-S.; Korner, H.; Breiner, T.; Ober, C. K. Chem Mater 1998, 10, 1475-1482; Ogino, K.; Chen, J.-S.; Ober, C. K. Chem Mater 1998, 10, 3833-3838; Wang, L.; Wong, C. P. J Polym Sci Part A: Polym Chem 1999, 37, 2991-3001; (e) Wang, D.; Lam, D. C. C. J Mater Sci Lett 2000, 19, 2109-2111; (f) Nakano, T.; Iwasa, H.; Miyagawa, N.; Takahara, S.; Yamaoka, T. J Photopolym Sci Technol 2000, 13, 715-717; (g) Wang, L.; Li, H.; Wong, C. P. J Polym Sci Part A: Polym Chem 2000, 38, 3771-3782; (h) Wang, L.; Wong, C. P. J Appl Polym Sci 2001, 81, 1868-1880; Malik, J.; Clarson, S. J. Polym Degrad Stab 2002, 76, 241-249; (j) Chen, J.-S.; Ober, C. K.; Poliks, M. D. Polymer 2002, 43, 131-139; (k) Gheneim, R.; Perez-Berumen, C.; Gandini, A. Macromolecules 2002, 35, 7246-7253; (1) Li, H. Y.; Wang, L. J.; Jacob, K.; Wong, C. P. J Polym Sci Part A: Polym Chem 2002, 40, 1796-1807; Wang, Z. G.; Xie, M. R.; Zhao, Y. F.; Yu, Y. Z.; Fang, S. B. Polymer 2003, 44, 923-929.
6. For recent publications on thermally or chemically degradable thermosets, see (a) Buchwalter, S. L.; Kosber, L. L. J Polym Sci Part A: Polym Chem 1996, 34, 249-260; (b) Yang, S.; Chen, J.-S.; Korner, H.; Breiner, T.; Ober, C. K. Chem Mater 1998, 10, 1475-1482; Ogino, K.; Chen, J.-S.; Ober, C. K. Chem Mater 1998, 10, 3833-3838; Wang, L.; Wong, C. P. J Polym Sci Part A: Polym Chem 1999, 37, 2991-3001; (e) Wang, D.; Lam, D. C. C. J Mater Sci Lett 2000, 19, 2109-2111; (f) Nakano, T.; Iwasa, H.; Miyagawa, N.; Takahara, S.; Yamaoka, T. J Photopolym Sci Technol 2000, 13, 715-717; (g) Wang, L.; Li, H.; Wong, C. P. J Polym Sci Part A: Polym Chem 2000, 38, 3771-3782; (h) Wang, L.; Wong, C. P. J Appl Polym Sci 2001, 81, 1868-1880; Malik, J.; Clarson, S. J. Polym Degrad Stab 2002, 76, 241-249; (j) Chen, J.-S.; Ober, C. K.; Poliks, M. D. Polymer 2002, 43, 131-139; (k) Gheneim, R.; Perez-Berumen, C.; Gandini, A. Macromolecules 2002, 35, 7246-7253; (1) Li, H. Y.; Wang, L. J.; Jacob, K.; Wong, C. P. J Polym Sci Part A: Polym Chem 2002, 40, 1796-1807; Wang, Z. G.; Xie, M. R.; Zhao, Y. F.; Yu, Y. Z.; Fang, S. B. Polymer 2003, 44, 923-929.
7. For recent publications on thermally or chemically degradable thermosets, see (a) Buchwalter, S. L.; Kosber, L. L. J Polym Sci Part A: Polym Chem 1996, 34, 249-260; (b) Yang, S.; Chen, J.-S.; Korner, H.; Breiner, T.; Ober, C. K. Chem Mater 1998, 10, 1475-1482; Ogino, K.; Chen, J.-S.; Ober, C. K. Chem Mater 1998, 10, 3833-3838; Wang, L.; Wong, C. P. J Polym Sci Part A: Polym Chem 1999, 37, 2991-3001; (e) Wang, D.; Lam, D. C. C. J Mater Sci Lett 2000, 19, 2109-2111; (f) Nakano, T.; Iwasa, H.; Miyagawa, N.; Takahara, S.; Yamaoka, T. J Photopolym Sci Technol 2000, 13, 715-717; (g) Wang, L.; Li, H.; Wong, C. P. J Polym Sci Part A: Polym Chem 2000, 38, 3771-3782; (h) Wang, L.; Wong, C. P. J Appl Polym Sci 2001, 81, 1868-1880; Malik, J.; Clarson, S. J. Polym Degrad Stab 2002, 76, 241-249; (j) Chen, J.-S.; Ober, C. K.; Poliks, M. D. Polymer 2002, 43, 131-139; (k) Gheneim, R.; Perez-Berumen, C.; Gandini, A. Macromolecules 2002, 35, 7246-7253; (1) Li, H. Y.; Wang, L. J.; Jacob, K.; Wong, C. P. J Polym Sci Part A: Polym Chem 2002, 40, 1796-1807; Wang, Z. G.; Xie, M. R.; Zhao, Y. F.; Yu, Y. Z.; Fang, S. B. Polymer 2003, 44, 923-929.
8. For recent publications on thermally or chemically degradable thermosets, see (a) Buchwalter, S. L.; Kosber, L. L. J Polym Sci Part A: Polym Chem 1996, 34, 249-260; (b) Yang, S.; Chen, J.-S.; Korner, H.; Breiner, T.; Ober, C. K. Chem Mater 1998, 10, 1475-1482; Ogino, K.; Chen, J.-S.; Ober, C. K. Chem Mater 1998, 10, 3833-3838; Wang, L.; Wong, C. P. J Polym Sci Part A: Polym Chem 1999, 37, 2991-3001; (e) Wang, D.; Lam, D. C. C. J Mater Sci Lett 2000, 19, 2109-2111; (f) Nakano, T.; Iwasa, H.; Miyagawa, N.; Takahara, S.; Yamaoka, T. J Photopolym Sci Technol 2000, 13, 715-717; (g) Wang, L.; Li, H.; Wong, C. P. J Polym Sci Part A: Polym Chem 2000, 38, 3771-3782; (h) Wang, L.; Wong, C. P. J Appl Polym Sci 2001, 81, 1868-1880; Malik, J.; Clarson, S. J. Polym Degrad Stab 2002, 76, 241-249; (j) Chen, J.-S.; Ober, C. K.; Poliks, M. D. Polymer 2002, 43, 131-139; (k) Gheneim, R.; Perez-Berumen, C.; Gandini, A. Macromolecules 2002, 35, 7246-7253; (1) Li, H. Y.; Wang, L. J.; Jacob, K.; Wong, C. P. J Polym Sci Part A: Polym Chem 2002, 40, 1796-1807; Wang, Z. G.; Xie, M. R.; Zhao, Y. F.; Yu, Y. Z.; Fang, S. B. Polymer 2003, 44, 923-929.
9. For recent publications on thermally or chemically degradable thermosets, see (a) Buchwalter, S. L.; Kosber, L. L. J Polym Sci Part A: Polym Chem 1996, 34, 249-260; (b) Yang, S.; Chen, J.-S.; Korner, H.; Breiner, T.; Ober, C. K. Chem Mater 1998, 10, 1475-1482; Ogino, K.; Chen, J.-S.; Ober, C. K. Chem Mater 1998, 10, 3833-3838; Wang, L.; Wong, C. P. J Polym Sci Part A: Polym Chem 1999, 37, 2991-3001; (e) Wang, D.; Lam, D. C. C. J Mater Sci Lett 2000, 19, 2109-2111; (f) Nakano, T.; Iwasa, H.; Miyagawa, N.; Takahara, S.; Yamaoka, T. J Photopolym Sci Technol 2000, 13, 715-717; (g) Wang, L.; Li, H.; Wong, C. P. J Polym Sci Part A: Polym Chem 2000, 38, 3771-3782; (h) Wang, L.; Wong, C. P. J Appl Polym Sci 2001, 81, 1868-1880; Malik, J.; Clarson, S. J. Polym Degrad Stab 2002, 76, 241-249; (j) Chen, J.-S.; Ober, C. K.; Poliks, M. D. Polymer 2002, 43, 131-139; (k) Gheneim, R.; Perez-Berumen, C.; Gandini, A. Macromolecules 2002, 35, 7246-7253; (1) Li, H. Y.; Wang, L. J.; Jacob, K.; Wong, C. P. J Polym Sci Part A: Polym Chem 2002, 40, 1796-1807; Wang, Z. G.; Xie, M. R.; Zhao, Y. F.; Yu, Y. Z.; Fang, S. B. Polymer 2003, 44, 923-929.
10. For recent publications on thermally or chemically degradable thermosets, see (a) Buchwalter, S. L.; Kosber, L. L. J Polym Sci Part A: Polym Chem 1996, 34, 249-260; (b) Yang, S.; Chen, J.-S.; Korner, H.; Breiner, T.; Ober, C. K. Chem Mater 1998, 10, 1475-1482; Ogino, K.; Chen, J.-S.; Ober, C. K. Chem Mater 1998, 10, 3833-3838; Wang, L.; Wong, C. P. J Polym Sci Part A: Polym Chem 1999, 37, 2991-3001; (e) Wang, D.; Lam, D. C. C. J Mater Sci Lett 2000, 19, 2109-2111; (f) Nakano, T.; Iwasa, H.; Miyagawa, N.; Takahara, S.; Yamaoka, T. J Photopolym Sci Technol 2000, 13, 715-717; (g) Wang, L.; Li, H.; Wong, C. P. J Polym Sci Part A: Polym Chem 2000, 38, 3771-3782; (h) Wang, L.; Wong, C. P. J Appl Polym Sci 2001, 81, 1868-1880; Malik, J.; Clarson, S. J. Polym Degrad Stab 2002, 76, 241-249; (j) Chen, J.-S.; Ober, C. K.; Poliks, M. D. Polymer 2002, 43, 131-139; (k) Gheneim, R.; Perez-Berumen, C.; Gandini, A. Macromolecules 2002, 35, 7246-7253; (1) Li, H. Y.; Wang, L. J.; Jacob, K.; Wong, C. P. J Polym Sci Part A: Polym Chem 2002, 40, 1796-1807; Wang, Z. G.; Xie, M. R.; Zhao, Y. F.; Yu, Y. Z.; Fang, S. B. Polymer 2003, 44, 923-929.
11. For recent publications on thermally or chemically degradable thermosets, see (a) Buchwalter, S. L.; Kosber, L. L. J Polym Sci Part A: Polym Chem 1996, 34, 249-260; (b) Yang, S.; Chen, J.-S.; Korner, H.; Breiner, T.; Ober, C. K. Chem Mater 1998, 10, 1475-1482; Ogino, K.; Chen, J.-S.; Ober, C. K. Chem Mater 1998, 10, 3833-3838; Wang, L.; Wong, C. P. J Polym Sci Part A: Polym Chem 1999, 37, 2991-3001; (e) Wang, D.; Lam, D. C. C. J Mater Sci Lett 2000, 19, 2109-2111; (f) Nakano, T.; Iwasa, H.; Miyagawa, N.; Takahara, S.; Yamaoka, T. J Photopolym Sci Technol 2000, 13, 715-717; (g) Wang, L.; Li, H.; Wong, C. P. J Polym Sci Part A: Polym Chem 2000, 38, 3771-3782; (h) Wang, L.; Wong, C. P. J Appl Polym Sci 2001, 81, 1868-1880; Malik, J.; Clarson, S. J. Polym Degrad Stab 2002, 76, 241-249; (j) Chen, J.-S.; Ober, C. K.; Poliks, M. D. Polymer 2002, 43, 131-139; (k) Gheneim, R.; Perez-Berumen, C.; Gandini, A. Macromolecules 2002, 35, 7246-7253; (1) Li, H. Y.; Wang, L. J.; Jacob, K.; Wong, C. P. J Polym Sci Part A: Polym Chem 2002, 40, 1796-1807; Wang, Z. G.; Xie, M. R.; Zhao, Y. F.; Yu, Y. Z.; Fang, S. B. Polymer 2003, 44, 923-929.
12. For recent publications on thermally or chemically degradable thermosets, see (a) Buchwalter, S. L.; Kosber, L. L. J Polym Sci Part A: Polym Chem 1996, 34, 249-260; (b) Yang, S.; Chen, J.-S.; Korner, H.; Breiner, T.; Ober, C. K. Chem Mater 1998, 10, 1475-1482; Ogino, K.; Chen, J.-S.; Ober, C. K. Chem Mater 1998, 10, 3833-3838; Wang, L.; Wong, C. P. J Polym Sci Part A: Polym Chem 1999, 37, 2991-3001; (e) Wang, D.; Lam, D. C. C. J Mater Sci Lett 2000, 19, 2109-2111; (f) Nakano, T.; Iwasa, H.; Miyagawa, N.; Takahara, S.; Yamaoka, T. J Photopolym Sci Technol 2000, 13, 715-717; (g) Wang, L.; Li, H.; Wong, C. P. J Polym Sci Part A: Polym Chem 2000, 38, 3771-3782; (h) Wang, L.; Wong, C. P. J Appl Polym Sci 2001, 81, 1868-1880; Malik, J.; Clarson, S. J. Polym Degrad Stab 2002, 76, 241-249; (j) Chen, J.-S.; Ober, C. K.; Poliks, M. D. Polymer 2002, 43, 131-139; (k) Gheneim, R.; Perez-Berumen, C.; Gandini, A. Macromolecules 2002, 35, 7246-7253; (1) Li, H. Y.; Wang, L. J.; Jacob, K.; Wong, C. P. J Polym Sci Part A: Polym Chem 2002, 40, 1796-1807; Wang, Z. G.; Xie, M. R.; Zhao, Y. F.; Yu, Y. Z.; Fang, S. B. Polymer 2003, 44, 923-929.
13. For recent publications on thermally or chemically degradable thermosets, see (a) Buchwalter, S. L.; Kosber, L. L. J Polym Sci Part A: Polym Chem 1996, 34, 249-260; (b) Yang, S.; Chen, J.-S.; Korner, H.; Breiner, T.; Ober, C. K. Chem Mater 1998, 10, 1475-1482; Ogino, K.; Chen, J.-S.; Ober, C. K. Chem Mater 1998, 10, 3833-3838; Wang, L.; Wong, C. P. J Polym Sci Part A: Polym Chem 1999, 37, 2991-3001; (e) Wang, D.; Lam, D. C. C. J Mater Sci Lett 2000, 19, 2109-2111; (f) Nakano, T.; Iwasa, H.; Miyagawa, N.; Takahara, S.; Yamaoka, T. J Photopolym Sci Technol 2000, 13, 715-717; (g) Wang, L.; Li, H.; Wong, C. P. J Polym Sci Part A: Polym Chem 2000, 38, 3771-3782; (h) Wang, L.; Wong, C. P. J Appl Polym Sci 2001, 81, 1868-1880; Malik, J.; Clarson, S. J. Polym Degrad Stab 2002, 76, 241-249; (j) Chen, J.-S.; Ober, C. K.; Poliks, M. D. Polymer 2002, 43, 131-139; (k) Gheneim, R.; Perez-Berumen, C.; Gandini, A. Macromolecules 2002, 35, 7246-7253; (1) Li, H. Y.; Wang, L. J.; Jacob, K.; Wong, C. P. J Polym Sci Part A: Polym Chem 2002, 40, 1796-1807; Wang, Z. G.; Xie, M. R.; Zhao, Y. F.; Yu, Y. Z.; Fang, S. B. Polymer 2003, 44, 923-929.
14. Shirai, M.; Morishita, S.; Okamura, H.; Tsunooka, M. Chem Mater 2002, 14, 334-340.
15. Okamura, H.; Toda, S.; Tsunooka, M.; Shirai, M. J Polym Sci Part A: Polym Chem 2002, 40, 3055-3062.
16. Shirai, M.; Kawaue, A.; Okamura, H.; Tsunooka, M. Chem Lett 2002, 940-941.
17. Shirai, M.; Kawaue, A.; Okamura, H.; Tsunooka, M. Chem Mater 2003, 15, 4075-4081.
18. Shirai, M.; Kinoshita, H.; Sumino, T.; Miwa, T.; Tsunooka, M. Chem Mater 1993, 5, 98-104.
19. 254 is 56,000 (L/mol cm) in acetonitrile. The quantum yield for the photochemical acid generation at 254 nm is 0.065 in a poly(methyl methacrylate) film.
20. The IUPAC name is benzene-1,3,5-tricarboxylic acid tris[1-methyl-1-(6-methyl-7-oxabicyclo[4,1,0]-hept-3-yl)ethyl] ester.
21. Ito, H.; Ueda, M. Macromolecules 1988, 21, 1475-1482.
22. Kinjo, N.; Ogata, M., Nishi, K.; Kaneda, A. Adv Polym Sci 1989, 88, 1-59.
23. Soane, D. S.; Martynenko, Z. Polymers in Microelectronics; Elsevier: New York, 1989.
24. Okamura, H.; Harada, C.; Morishita, S.; Shirai, M.; Tsunooka, M.; Fujiki, T.; Kawasaki, S.; Yamada, M. J Photopolym Sci Technol 2001, 14, 159-163.
25. Shirai, M.; Tsunooka, M. Bull Chem Soc Jpn 1998, 71, 2483-2507.
26. Lalevee, J.; Allonas, X.; Fouassier, J. P.; Shirai, M.; Tsunooka, M. Chem Lett 2003, 32, 178-179.