A polymeric photobase generator containing oxime-urethane groups: Crosslinking reaction and application to negative photoresist

Journal of Polymer Science, Part A: Polymer Chemistry

Volumn 42, Issue 4, 2004, Pages 975-984

  Chae, Kyu Ho ^a   Sung, Kyung Hee ^a  

^a Chonnam National University   (South Korea)

Author keywords

Crosslinking; Irradiation; Photochemistry; Photoresists

Indexed keywords

ABSORPTION SPECTROSCOPY; ACRYLICS; CHEMICAL BONDS; COPOLYMERIZATION; COPOLYMERS; HIGH PERFORMANCE LIQUID CHROMATOGRAPHY; INFRARED SPECTROSCOPY; MATHEMATICAL MODELS; MOLECULAR WEIGHT; PHOTOLYSIS; PHOTORESISTS; ULTRAVIOLET RADIATION;

METHACRYLOXYETHYL BENZOPHENONEOXIME URETHANE; METHYL METHACRYLATE; OXIME; POLYMERIC PHOTOBASE GENERATOR; URETHANE;

CROSSLINKING;

CROSS LINKING; POLYMER SCIENCE;

EID: 1342324950     PISSN: 0887624X     EISSN: None     Source Type: Journal    
DOI: 10.1002/pola.11032     Document Type: Article

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