Laser flash photolysis study of two aromatic N-oxyimidosulfonate photoacid generators

Chemistry of Materials

Volumn 12, Issue 2, 2000, Pages 414-420

  Ortica, F ^a   Scaiano, J C ^a   Pohlers, G ^b   Cameron, J F ^b   Zampini, A ^b  

^a UNIVERSITY OF OTTAWA   (Canada)

^b SHIPLEY COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACETONITRILE; ANTHRACENE; AROMATIC COMPOUND; BENZENE; IMIDE; PHTHALIMIDE DERIVATIVE; SULFONIC ACID DERIVATIVE;

ABSORPTION SPECTROSCOPY; ARTICLE; CHEMICAL STRUCTURE; CRYSTALLIZATION; ELECTRONICS; EXCIMER LASER; FLUORESCENCE; PHOTOCHEMISTRY; PHOTOLYSIS;

EID: 0033803466     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm990440t     Document Type: Article

References (31)

1. Thompson, L. F.; Willson, C. G.; Bowden, M. J. Introduction to Microlithography, 2nd ed.; American Chemical Society, Washington, DC, 1994 and references therein.
2. Reiser, A. Photoreactive Polymers - The Science and Technology of Resists, Wiley-Interscience Publications: New York, 1989.
3. Lin, B. J. J. Vac. Sci. Technol. 1975, 12, 1317.
4. Bruning, J. H. J. Vac. Sci. Technol. 1979, 16, 1925.
5. Iwanayagi, T.; Ueno, T.; Nonogaki, S.; Ito, H.; Willson, C. G. IBM Res. Rep., 1987, No. RJ 5826.
6. Cullman, E. Lambda Physik. Highlights 1987, Apr., p 9.
7. Ehrlich, D. J. Solid State Technol. 1985, 28 (12), 81.
8. Pappas, S. P. J. Imaging Technol. 1985, 11, 146 and references therein.
9. Padwa, A. Organic Photochemistry; Marcel Dekker: New York, 1981.
10. Shirai, M.; Wakinaka, S.; Ishida, H.; Tsunooka, M.; Tanaka, M. J. Polym. Sci., Part C: Polym. Lett. 1986, 24, 119.
11. Aoai, T.; Kodama, K.; Yamanaka, T.; Yagihara, M. J. Photopolym. Sci. Technol. 1998, 11 (3), 409.
12. Cadogan, J. I. G.; Rowley, A. G. J. Chem. Soc., Perkin Trans. 1 1975, 1069.
13. Edwards, O. E.; Bernath, G.; Dixon, J.; Paton, J. M.; Vocelle, D. Can. J. Chem. 1974, 52, 2123.
14. Gassman, P. G.; Campbell, G. A. Chem. Commun. 1971, 1437.
15. Pohlers, G.; Scaiano, J. C.; Sinta, R. Chem. Mater. 1997, 9, 3222.
16. Scaiano, J. C.; Tanner, M.; Weir, D. J. Am. Chem. Soc. 1985, 107, 4396.
17. Scaiano, J. C. J. Am. Chem. Soc. 1980, 102, 7747.
18. Mohtat, N.; Cozens, F.; Scaiano, J. C. J. Phys. Chem. B 1998, 102, 7557.
19. Meech, S. R.; Phillips, D. J. Photochem. 1983, 23, 193.
20. Inbar, S.; Linschitz, H.; Cohen, S. G. J. Am. Chem. Soc. 1981, 103, 1048.
21. Adam, W.; Moorthy, J. N.; Nau, W. M.; Scaiano, J. C. J. Org. Chem. 1997, 62, 8082.
22. Johnston, L. J.; Lougnot, D. J.; Wintgens, V. Scaiano, J. C. J. Am. Chem. Soc. 1988, 110, 518.
23. Mirbach, M. F.; Mirbach, M. J.; Saus, A. Chem. Rev. 1982, 82, 59.
24. Leigh, W. J.; Scaiano, J. C. Unpublished results.
25. Carmichael, I.; Helman, W. P.; Hug, G. L. J. Phys. Chem. Ref. Data 1987, 6, 239.
26. Pohlers, G.; Scaiano, J. C.; Sinta, R.; Brainard, R.; Pai, D. Chem. Mater. 1997, 9, 1353.
27. Bensasson, R.; Land, E. J. Trans. Faraday Soc. 1971, 67, 1904.
28. Gijzeman, O. L. J.; Kaufman, F.; Porter, G. J. Chem. Soc., Faraday Trans. 2 1973, 69, 708.
29. Smith, G. J. J. Chem. Soc., Faraday Trans. 2 1982, 78, 769.
30. Stang, P. J.; Hanack, M.; Subramanian, L. R. Synthesis 1982, 85.
31. Brunsvold, W.; Kwong, R.; Montgomery, W.; Moreau, W.; Sachdev, H.; Welsh, K. Advances in Resist Technology and Processing VII. SPIE 1990, 1262, 162.