Vanadyl Precursors Used to Modify the Properties of Vanadium Oxide Thin Films Obtained by Chemical Vapor Deposition

Journal of the Electrochemical Society

Volumn 146, Issue 2, 1999, Pages 551-558

  Barreca, Davide ^a   Depero, Laura E ^b   Franzato, Enrico ^a   Rizzi, Gian Andrea ^a   Sangaletti, Luigi ^b   Tondello, Eugenio ^a   Vettori, Umberto ^a  

^a UNIVERSITY OF PADOVA   (Italy)

^b UNIVERSITY OF BRESCIA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; FILM PREPARATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MASS SPECTROMETRY; MICROSTRUCTURE; MORPHOLOGY; PYROLYSIS; SYNTHESIS (CHEMICAL); VANADIUM COMPOUNDS; VAPORS;

VANADIUM OXIDE;

SEMICONDUCTING FILMS;

EID: 0033075193     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1391642     Document Type: Article

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