Investigation on hexamethyldisilazane vapor treatment of plasma-damaged nanoporous organosilicate films

Applied Surface Science

Volumn 252, Issue 18, 2006, Pages 6323-6331

  Rajagopalan, T ^a   Lahlouh, B ^a   Lubguban, J A ^b   Biswas, N ^a   Gangopadhyay, S ^b   Sun, J ^c   Huang, D H ^c   Simon, S L ^c   Toma, D ^d   Butler, R ^d  

^a TEXAS TECH UNIVERSITY   (United States)

^b UNIVERSITY OF MISSOURI   (United States)

^c Department of Electrical and Computer Engineering   (United States)

^d TEL   (United States)

Author keywords

Low k; Plasma damage; Porous films; Supercritical CO 2

Indexed keywords

CURING; FOURIER TRANSFORM INFRARED SPECTROSCOPY; PARAFFINS; PERMITTIVITY; PLASMA APPLICATIONS; SURFACE TREATMENT;

LOW-K; PLASMA-DAMAGE; POROUS FILMS; SUPERCRITICAL CO2;

THIN FILMS;

EID: 33746715041     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2005.08.060     Document Type: Article

References (24)

1. Grill A., and Patel V. Appl. Phys. Lett. 79 (2001) 803
2. Golden J., Hawker C., and Ho P. Semicond. Int. 24 (2001) 79
3. Sugahara S., Usami K., and Matsumura M. Jpn. J. App. Phys. 38 (1999) 1428
4. Kim D., Lee Y., and Park N. Appl. Phys. Lett. 69 (1996) 2779
5. Kohl P., Padovani A., Wedlake M., Bhusari D., Ann S., Allen B., Shick R., and Rhodes L. Mat. Res. Soc. Symp. Proc. 565 (1999) 55
6. Colomer M. Mat. Res. Soc. Symp. Proc. 565 (1999) 211
7. Pangrle S., Nitta S., and Pellerin J. Proceedings of the 1999 VMIC Conference, vol. 161. September (1999)
8. Hong J., Kim H., and Park H. Thin-Solid Films 332 (1998) 449
9. Chang T.C., Mor Y.S., Liu P.T., Chen C.W., Mei Y.J., and Sze S.M. J. Electrochem. Soc. 149 (2002) F81
10. Mor Y.S., Chang T.C., Liu P.T., Tsai T.M., Chen C.W., Yan S.T., Chu C.J., Wu W.F., Pan F.M., Lur W., and Sze S.M. J. Vac. Sci. Technol. B 20 (2002) 1334
11. Kondoh E., Asano T., Arao H., Nakashima A., and Komatsu M. Jpn. J. Appl. Phys. 39 7A, Pt.1 (2000) 3919
12. Chang T.C., Mor Y.S., Liu P.T., Tsai T.M., Chen C.W., Mei Y.J., Pan F.M., Wu W.F., and Sze S.M. Microelectron. Eng. 60 (2002) 469
13. Wang Y.H., Gui D., Kumar R., and Foo P.D. Electrochem. Solid-State Lett. 6 (2003) F1
14. Gorman B.P., Mueller D.W., and Reidy R.F. Electrochem. Solid-State Lett. 6 (2003) F40
15. Xie B., and Muscat A.J. Microelecton. Eng. 76 (2004) 52
16. Lahlouh B., Lubguban J.A., Sivaraman G., Gale R., and Gangopadhyay S. Electrochem. Solid-State Lett. 7 (2004) G338
17. Namatsu H. J. Vac. Sci. Technol. B 19 (2001) 2709
18. Socrates G. Infrared Characteristics Group Frequencies (1994), Wiley, New York
19. Lubguban J., Rajagopalan T., Metha N., Lahlouh B., Simon S., and Gangopadhyay S. J. Appl. Phys. 92 (2002) 1033
20. Combes J.R., White L.D., and Tripp C.P. Langmuir 15 (1999) 7870
21. Hair M.L. Infrared Spectroscopy in Surface Chemistry (1967), Marcel Dekker Inc., New York
22. Wang C.Y., Shen Z.X., and Zheng J.Z. Appl. Spectrosc. 54 (2000) 209
23. N. Biswas, B. Lahlouh, Indra Chari, S. Gangopadhyay, D. Toma, to be communicated.
24. Tripp C.P., and Combes J.R. Langmuir 14 (1998) 7348