Structural properties of ultra-low-energy ion-implanted silicon studied by combined X-ray scattering methods

Journal of Applied Crystallography

Volumn 39, Issue 4, 2006, Pages 571-581

  Capello, L ^a,b   Metzger, T H ^a   Holy V ^c   Servidori, M ^d   Malachias, A ^a,e  

^a EUROPEAN SYNCHROTRON RADIATION FACILITY   (France)

^b CEA GRENOBLE   (France)

^c CHARLES UNIVERSITY   (Czech Republic)

^d CNR   (Italy)

^e LABORATÓRIO NACIONAL DE LUZ SÍNCROTRON   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 33746424444     PISSN: 00218898     EISSN: 16005767     Source Type: Journal    
DOI: 10.1107/S0021889806018917     Document Type: Article

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