메뉴 건너뛰기




Volumn 114-115, Issue SPEC. ISS., 2004, Pages 77-81

Evolution of end-of-range defects in Si after Xe implantation studied by grazing incidence diffuse X-ray scattering

Author keywords

Crystal microstructure defects; Stacking faults; X ray scattering

Indexed keywords

CMOS INTEGRATED CIRCUITS; CRYSTAL MICROSTRUCTURE; RAPID THERMAL ANNEALING; SEMICONDUCTOR JUNCTIONS; SILICON; STACKING FAULTS; TRANSMISSION ELECTRON MICROSCOPY; X RAY SCATTERING; X RAYS;

EID: 10644263073     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2004.07.074     Document Type: Conference Paper
Times cited : (4)

References (10)
  • 6
    • 85166078295 scopus 로고    scopus 로고
    • http://www.esrf.fr/exp.facilities/IDl/user_guide/.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.