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Journal of Ceramic Processing Research

Volumn 7, Issue 2, 2006, Pages 172-176

Effect of CF4 plasma treatment on fluorinated amorphous carbon films with a low dielectric constant

(4) Ko, Ho Jeong a Lee, Heon Ju a Lee, Kwang Man a Choi, Chi Kyu a

a Jeju National University (South Korea)

Author keywords

a C:F; CF4 plasma treatment; Dielectric constant; ICPCVD

Indexed keywords

EID: 33745886253 PISSN: 12299162 EISSN: None Source Type: Journal
DOI: None Document Type: Article

Times cited : (4)

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