Deposition of fluorinated amorphous carbon thin films as a low-dielectric-constant material

Journal of the Electrochemical Society

Volumn 146, Issue 9, 1999, Pages 3383-3388

  Han, Sang Soo ^a   Kim, Hun Rae ^a   Bae, Byeong Soo ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; CARBON; CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; COMPOSITION EFFECTS; FLUORINE COMPOUNDS; PERMITTIVITY; PLASMA APPLICATIONS; REFRACTIVE INDEX; SATURATION (MATERIALS COMPOSITION); THIN FILMS;

ELASTIC RECOIL DETECTION ANALYSIS; INDUCTIVELY-COUPLED PLASMAS (ICP);

DIELECTRIC FILMS;

EID: 0033363296     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1392482     Document Type: Article

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