Passivation effect on low-k SiOC dielectrics by H2 plasma treatment

Journal of the Korean Physical Society

Volumn 40, Issue 1, 2002, Pages 94-98

  Kim, Yoon Hae ^a   Kim, Hyeong Joon ^a   Kim, Jin Yong ^b   Lee, Young ^c  

^a Seoul National University   (South Korea)

^b Seoul National University   (South Korea)

^c Jusung Engineering Company Limited   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0036002398     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

References (11)

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