Considerations for the use of defocus models for OPC

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5756, Issue , 2005, Pages 427-436

  Sturtevant, John L ^a   Torres, J A ^a   Word, J ^a   Granik, Y ^a   LaCour, P ^a  

^a MENTOR GRAPHICS CORPORATION   (United States)

Author keywords

DFM; DOF; Model Based OPC; ORC; Process Window

Indexed keywords

DFM; DOF; MODEL BASED OPC; ORC; PROCESS WINDOW;

BUDGET CONTROL; MICROELECTRONICS; OPTICAL DESIGN; OPTICAL SYSTEMS;

OPTICAL ENGINEERING;

EID: 25144494085     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.598059     Document Type: Conference Paper

References (6)

1. Schulze, S., Park, O., Zimmerman, R., Chen, M., LaCour, P., Sahouria, E., Granik, Y., Cobb, N., "Model Based OPC Considering Process Window Aspects-a Study", Proc. SPIE 4691, 1097 (2002).
2. Thiele, J, Anke, I., Haffner, H., Semmler, A., "Improved Maunfacturability by OPC based upon Defocus Data", Proc. SPIE 5042, 135 (2003).
3. N. Cobb, Y. Granik, "OPC methods to improve image slope and process window", Proc. SPIE 5042, 116 (2003).
4. Takase, S, "Controlling Defocus Impact on OPC Performance", Proc. SPIE 5130, 847 (2003).
5. Hector, S.,Postnikov, S., Cobb, J., "Evaluating CD Control Requirements of ITRS" Proc SPIE 5377, 555 (2004).
6. Sturtevant, J., Word, J., LaCour, P., Park, J., Smith, D., "Assessing the Impact of Real World Manufacturing Lithography Variations on post-OPC CD Control", Proc. SPIE 5754 (2005) to be published.