Opc methods to improve image slope and process window

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5042, Issue , 2003, Pages 116-125

  Cobb, Nick ^a   Granik, Yuri ^a  

^a MENTOR GRAPHICS CORPORATION   (United States)

Author keywords

MEEF; OPC; Process window

Indexed keywords

ALGORITHMS; EDGE DETECTION; LIGHTING; ROBUSTNESS (CONTROL SYSTEMS);

OPTICAL PROXIMITY CORRECTION (OPC);

IMAGE RECONSTRUCTION;

EID: 0242693875     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.515190     Document Type: Conference Paper

References (9)

1. Y. Granik, "Generalized MEEF theory", Interface 2001.
2. Y. Granik, N. Cobb, "MEEF as a matrix", BACUS 2001, Proc. SPIE Vol. 4562, p. 980-991, 2002.
3. Y. Granik, N. Cobb, "Two-dimensional G-MEEF Theory and Applications", Photomask Japan 2002, Proc. SPIE Vol. 4754, p. 146-155, 2002.
4. N. Cobb and Y. Granik, "Model-based OPC using the MEEF matrix", BACUS 2002, Proc. SPIE Vol. 4889, pp. 1281-1292, Monterey, 2002.
5. B. Smith and D. Ewbank. "OPC and image optimization using localized frequency analysis", Proc. SPIE Vol 4691, p. 148, 2002.
6. L. Liebmann et al, "Optimizing style options for subresolution assist features", Proc SPIE Vol 4346, p.141, 2001.
7. S. Mansfield et al, "Lithographic comparison of assist feature design strategies", Proc SPIE Vol 4000, p. 63, 2000.
8. A.Torres et al, "Contrast-based assist feature optimization", Proc SPIE Vol 4691, p. 179-187, 2002.
9. T. Brist and A. Torres, "Model-assisted placement of sub-resolution assist features: experimental result", presented SPIE 5042-9, Santa Clara, 2002.