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Volumn 5853 PART II, Issue , 2005, Pages 607-613

Etch modeling in RET synthesis and verification flow

Author keywords

Constant threshold; Etch correction; Etch modeling; OPC; PPC; Variable threshold

Indexed keywords

ETCH MODELING; RET SYNTHESIS;

ETCHING; PHOTOLITHOGRAPHY;

MASKS;

EID: 28544439970 PISSN: 0277786X EISSN: None Source Type: Conference Proceeding
DOI: 10.1117/12.617143 Document Type: Conference Paper

Times cited : (7)

References (10)

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