Off-target model based OPC

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5992, Issue 2, 2005, Pages

  Lu, Mark ^a,b,c   Liang, Curtis ^b   King, Dion ^b   Melvin III, Lawrence S ^d  

^a UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

^b SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

^c SEMICONDUCTOR MANUFACTURING INTERNATIONAL CORPORATION   (China)

^d SYNOPSYS INC   (United States)

Author keywords

Model based OPC; Off target; OPC; Pattern; Process robustness

Indexed keywords

LOGIC GATES; MATHEMATICAL MODELS; PATTERN RECOGNITION; ROBUSTNESS (CONTROL SYSTEMS);

MODEL-BASED OPC; OFF-TARGET; OPC; PATTERN; PROCESS ROBUSTNESS;

OPTICAL SYSTEMS;

EID: 33644598457     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.633116     Document Type: Conference Paper

References (3)

1. Chris A. Mack, "Corner Rounding and Line-end Shorting in Optical Lithography" Proceedings of SPIE Vol. 4226 (October 2000).
2. Lawrence S. Melvin III, James P. Shiely and Qiliang Yan, "Detecting Focus-Sensitive Configurations During OPC" Proceedings of SPIE Vol. 5756
3. Synopsys application note: Vector model in thin film stack