Model-based PPC verification methodology with two-dimensional pattern feature extraction

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5040 II, Issue , 2003, Pages 1156-1165

  Hashimoto, Kohji ^a   Ito, Takeshi ^a   Ikeda, Takahiro ^a   Nojima, Shigeki ^a   Inoue, Soichi ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

Model based PPC; Process proximity correction (PPC); Process proximity effect (PPE); Tandem PPC; Two dimensional pattern feature extraction

Indexed keywords

CMOS INTEGRATED CIRCUITS; COMPUTER AIDED DESIGN; COMPUTER SIMULATION; FEATURE EXTRACTION; GATES (TRANSISTOR); INTEGRATED CIRCUIT LAYOUT; LSI CIRCUITS; MASKS;

PROCESS PROXIMITY CORRECTION; PROCESS PROXIMITY EFFECT; TWO DIMENSIONAL PATTER FEATURE EXTRACTION; WAFER FABRICATION;

LITHOGRAPHY;

EID: 0141610152     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485511     Document Type: Conference Paper

References (5)

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2. R.Matsuoka, Electronic Journal (in Japanese), pp. 104-105, July 2000
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4. S.Nojima, S.Mimotogi, M.Itoh, O.Ikenaga, S.Hasebe, K.Hashimoto, S.Inoue, M.Goto and I.Mori, "Flexible mask specifications", Proc. SPIE 22nd Annual BACUS Symposium on Photomask Technology, Vol.4889, pp.187-196, 2002
5. K.Hashimoto, T.Kuji, S.Tokutome, T.Kotani, S.Tanaka and S.Inoue, "Tandem Process Proximity Correction Method", Proc. SPIE Symposium Optical Microlithography XV, Vol.4691, pp.1070-1081, 2002